Low-field emission of electrons by thin metal films: effect of composition, deposition conditions and morphology on emission capability of a film
The paper presents experimental study of the phenomenon of low-threshold field electron emission from thin films of several metals: Mo, W, Zr, Ni and Ti. We used magnetron sputtering with variable process parameters to deposit films of various thicknesses on silicon substrates of different types. A...
| Main Authors: | , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
Peter the Great St.Petersburg Polytechnic University
2021-03-01
|
| Series: | St. Petersburg Polytechnical University Journal: Physics and Mathematics |
| Subjects: | |
| Online Access: | https://physmath.spbstu.ru/article/2021.51.08/ |
| _version_ | 1819124532379648000 |
|---|---|
| author | Bizyaev Ivan Gabdullin Pavel Gnuchev Nikolay Arkhipov Alexander |
| author_facet | Bizyaev Ivan Gabdullin Pavel Gnuchev Nikolay Arkhipov Alexander |
| author_sort | Bizyaev Ivan |
| collection | DOAJ |
| description | The paper presents experimental study of the phenomenon of low-threshold field electron emission from thin films of several metals: Mo, W, Zr, Ni and Ti. We used magnetron sputtering with variable process parameters to deposit films of various thicknesses on silicon substrates of different types. A number of species of these films having effective (mean) thickness 6–10 nm produced electron emission at room temperature in dc electric field with macroscopic strength as low as a few Volts per micrometer. Optimized thermal/field treatment procedure further improved their emission properties reducing the threshold field by several times. Atomic force microscopy study revealed a correlation between emission properties of the films and their surface topography, namely, the presence of grains with lateral dimensions 20–50 nm and height ~2 nm. At the same time, no equally pronounced correlation of the emissivity with other characteristics of coatings (including the sort of the metal and the silicon substrate conductivity type) was detected. Results of the study witness in favor of two-temperature (or hot-electron) emission mechanism for the investigated coatings. |
| first_indexed | 2024-12-22T07:25:44Z |
| format | Article |
| id | doaj.art-5105eb0a104c4e3e9fb14ec5013f57f5 |
| institution | Directory Open Access Journal |
| issn | 2405-7223 |
| language | English |
| last_indexed | 2024-12-22T07:25:44Z |
| publishDate | 2021-03-01 |
| publisher | Peter the Great St.Petersburg Polytechnic University |
| record_format | Article |
| series | St. Petersburg Polytechnical University Journal: Physics and Mathematics |
| spelling | doaj.art-5105eb0a104c4e3e9fb14ec5013f57f52022-12-21T18:34:09ZengPeter the Great St.Petersburg Polytechnic UniversitySt. Petersburg Polytechnical University Journal: Physics and Mathematics2405-72232021-03-0114110.18721/JPM.1410820714726Low-field emission of electrons by thin metal films: effect of composition, deposition conditions and morphology on emission capability of a filmBizyaev Ivan0Gabdullin Pavel1Gnuchev Nikolay2Arkhipov Alexander3https://orcid.org/0000-0002-3321-7797Peter the Great St. Petersburg Polytechnic UniversityPeter the Great St. Petersburg Polytechnic UniversityPeter the Great St. Petersburg Polytechnic UniversityPeter the Great St. Petersburg Polytechnic UniversityThe paper presents experimental study of the phenomenon of low-threshold field electron emission from thin films of several metals: Mo, W, Zr, Ni and Ti. We used magnetron sputtering with variable process parameters to deposit films of various thicknesses on silicon substrates of different types. A number of species of these films having effective (mean) thickness 6–10 nm produced electron emission at room temperature in dc electric field with macroscopic strength as low as a few Volts per micrometer. Optimized thermal/field treatment procedure further improved their emission properties reducing the threshold field by several times. Atomic force microscopy study revealed a correlation between emission properties of the films and their surface topography, namely, the presence of grains with lateral dimensions 20–50 nm and height ~2 nm. At the same time, no equally pronounced correlation of the emissivity with other characteristics of coatings (including the sort of the metal and the silicon substrate conductivity type) was detected. Results of the study witness in favor of two-temperature (or hot-electron) emission mechanism for the investigated coatings.https://physmath.spbstu.ru/article/2021.51.08/field emissionthin filmsatomic force microscopyhot-electron emission |
| spellingShingle | Bizyaev Ivan Gabdullin Pavel Gnuchev Nikolay Arkhipov Alexander Low-field emission of electrons by thin metal films: effect of composition, deposition conditions and morphology on emission capability of a film St. Petersburg Polytechnical University Journal: Physics and Mathematics field emission thin films atomic force microscopy hot-electron emission |
| title | Low-field emission of electrons by thin metal films: effect of composition, deposition conditions and morphology on emission capability of a film |
| title_full | Low-field emission of electrons by thin metal films: effect of composition, deposition conditions and morphology on emission capability of a film |
| title_fullStr | Low-field emission of electrons by thin metal films: effect of composition, deposition conditions and morphology on emission capability of a film |
| title_full_unstemmed | Low-field emission of electrons by thin metal films: effect of composition, deposition conditions and morphology on emission capability of a film |
| title_short | Low-field emission of electrons by thin metal films: effect of composition, deposition conditions and morphology on emission capability of a film |
| title_sort | low field emission of electrons by thin metal films effect of composition deposition conditions and morphology on emission capability of a film |
| topic | field emission thin films atomic force microscopy hot-electron emission |
| url | https://physmath.spbstu.ru/article/2021.51.08/ |
| work_keys_str_mv | AT bizyaevivan lowfieldemissionofelectronsbythinmetalfilmseffectofcompositiondepositionconditionsandmorphologyonemissioncapabilityofafilm AT gabdullinpavel lowfieldemissionofelectronsbythinmetalfilmseffectofcompositiondepositionconditionsandmorphologyonemissioncapabilityofafilm AT gnuchevnikolay lowfieldemissionofelectronsbythinmetalfilmseffectofcompositiondepositionconditionsandmorphologyonemissioncapabilityofafilm AT arkhipovalexander lowfieldemissionofelectronsbythinmetalfilmseffectofcompositiondepositionconditionsandmorphologyonemissioncapabilityofafilm |