Low-field emission of electrons by thin metal films: effect of composition, deposition conditions and morphology on emission capability of a film

Low-field emission of electrons by thin metal films: effect of composition, deposition conditions and morphology on emission capability of a film

The paper presents experimental study of the phenomenon of low-threshold field electron emission from thin films of several metals: Mo, W, Zr, Ni and Ti. We used magnetron sputtering with variable process parameters to deposit films of various thicknesses on silicon substrates of different types. A...

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Bibliographic Details
Main Authors: Bizyaev Ivan, Gabdullin Pavel, Gnuchev Nikolay, Arkhipov Alexander
Format: Article
Language:English
Published: Peter the Great St.Petersburg Polytechnic University 2021-03-01
Series:St. Petersburg Polytechnical University Journal: Physics and Mathematics
Subjects:
field emission
thin films
atomic force microscopy
hot-electron emission
Online Access:https://physmath.spbstu.ru/article/2021.51.08/

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