Technology and performances of silicon oxynitride waveguides for optomechanical sensors fabricated by plasma-enhanced chemical vapour deposition
The technology and performance of micromachined channel waveguides, based on plasma-enhanced chemical vapour deposition (PECVD) of silicon oxynitride thin films, are presented. The deposition parameters of PECVD are studied in connection with their optical, mechanical and chemical properties. The de...
| 主要な著者: | , , , , , |
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| フォーマット: | 論文 |
| 言語: | English |
| 出版事項: |
EDP Sciences
2007-01-01
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| シリーズ: | Journal of the European Optical Society-Rapid Publications |
| 主題: | |
| オンライン･アクセス: | https://jeos.edpsciences.org/articles/jeos/pdf/2007/01/jeos20070207026.pdf |