Characterization of Electrical Traps Formed in Al<sub>2</sub>O<sub>3</sub> under Various ALD Conditions
Frequency dispersion in the accumulation region seen in multifrequency capacitance–voltage characterization, which is believed to be caused mainly by border traps, is a concerning issue in present-day devices. Because these traps are a fundamental property of oxides, their formation is expected to b...
Main Authors: | , , |
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Format: | Article |
Language: | English |
Published: |
MDPI AG
2020-12-01
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Series: | Materials |
Subjects: | |
Online Access: | https://www.mdpi.com/1996-1944/13/24/5809 |