Ethical Challenges in the Development of Virtual Assistants Powered by Large Language Models

Virtual assistants (VAs) have gained widespread popularity across a wide range of applications, and the integration of Large Language Models (LLMs), such as ChatGPT, has opened up new possibilities for developing even more sophisticated VAs. However, this integration poses new ethical issues and cha...

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Bibliographic Details
Main Authors: Andrés Piñeiro-Martín, Carmen García-Mateo, Laura Docío-Fernández, María del Carmen López-Pérez
Format: Article
Language:English
Published: MDPI AG 2023-07-01
Series:Electronics
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Online Access:https://www.mdpi.com/2079-9292/12/14/3170
Description
Summary:Virtual assistants (VAs) have gained widespread popularity across a wide range of applications, and the integration of Large Language Models (LLMs), such as ChatGPT, has opened up new possibilities for developing even more sophisticated VAs. However, this integration poses new ethical issues and challenges that must be carefully considered, particularly as these systems are increasingly used in public services: transfer of personal data, decision-making transparency, potential biases, and privacy risks. This paper, an extension of the work presented at IberSPEECH 2022, analyzes the current regulatory framework for AI-based VAs in Europe and delves into ethical issues in depth, examining potential benefits and drawbacks of integrating LLMs with VAs. Based on the analysis, this paper argues that the development and use of VAs powered by LLMs should be guided by a set of ethical principles that prioritize transparency, fairness, and harm prevention. The paper presents specific guidelines for the ethical use and development of this technology, including recommendations for data privacy, bias mitigation, and user control. By implementing these guidelines, the potential benefits of VAs powered by LLMs can be fully realized while minimizing the risks of harm and ensuring that ethical considerations are at the forefront of the development process.
ISSN:2079-9292