Comparison of NH<sub>3</sub> and N<sub>2</sub>O Plasma Treatments on Bi<sub>2</sub>O<sub>3</sub> Sensing Membranes Applied in an Electrolyte–Insulator–Semiconductor Structure

In this study, bismuth trioxide (Bi<sub>2</sub>O<sub>3</sub>) membranes in an electrolyte–insulator–semiconductor (EIS) structure were fabricated with pH sensing capability. To optimize the sensing performance, the membranes were treated with two types of plasma—NH<sub>...

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Main Authors: Chyuan-Haur Kao, Kuan-Lin Chen, Yi-Shiang Chiu, Lin Sang Hao, Shih-Ming Chen, Ming-Hsien Li, Ming-Ling Lee, Hsiang Chen
Format: Article
Language:English
Published: MDPI AG 2022-02-01
Series:Membranes
Subjects:
Online Access:https://www.mdpi.com/2077-0375/12/2/188
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author Chyuan-Haur Kao
Kuan-Lin Chen
Yi-Shiang Chiu
Lin Sang Hao
Shih-Ming Chen
Ming-Hsien Li
Ming-Ling Lee
Hsiang Chen
author_facet Chyuan-Haur Kao
Kuan-Lin Chen
Yi-Shiang Chiu
Lin Sang Hao
Shih-Ming Chen
Ming-Hsien Li
Ming-Ling Lee
Hsiang Chen
author_sort Chyuan-Haur Kao
collection DOAJ
description In this study, bismuth trioxide (Bi<sub>2</sub>O<sub>3</sub>) membranes in an electrolyte–insulator–semiconductor (EIS) structure were fabricated with pH sensing capability. To optimize the sensing performance, the membranes were treated with two types of plasma—NH<sub>3</sub> and N<sub>2</sub>O. To investigate the material property improvements, multiple material characterizations were conducted. Material analysis results indicate that plasma treatments with appropriate time could enhance the crystallization, remove the silicate and facilitate crystallizations. Owing to the material optimizations, the pH sensing capability could be greatly boosted. NH<sub>3</sub> or N<sub>2</sub>O plasma treated-Bi<sub>2</sub>O<sub>3</sub> membranes could reach the pH sensitivity around 60 mV/pH and show promise for future biomedical applications.
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spelling doaj.art-539a5dd61cb24042864513a89875a3f92023-11-23T21:03:14ZengMDPI AGMembranes2077-03752022-02-0112218810.3390/membranes12020188Comparison of NH<sub>3</sub> and N<sub>2</sub>O Plasma Treatments on Bi<sub>2</sub>O<sub>3</sub> Sensing Membranes Applied in an Electrolyte–Insulator–Semiconductor StructureChyuan-Haur Kao0Kuan-Lin Chen1Yi-Shiang Chiu2Lin Sang Hao3Shih-Ming Chen4Ming-Hsien Li5Ming-Ling Lee6Hsiang Chen7Department of Electronic Engineering, Chang Gung University, 259 Wen-Hwa 1st Road, Kwei-Shan District, Taoyuan City 333, TaiwanDepartment of Electronic Engineering, Chang Gung University, 259 Wen-Hwa 1st Road, Kwei-Shan District, Taoyuan City 333, TaiwanDepartment of Applied Materials and Optoelectronic Engineering, National Chi Nan University, Puli, Nantou 545, TaiwanDepartment of Applied Materials and Optoelectronic Engineering, National Chi Nan University, Puli, Nantou 545, TaiwanDepartment of Applied Materials and Optoelectronic Engineering, National Chi Nan University, Puli, Nantou 545, TaiwanDepartment of Applied Materials and Optoelectronic Engineering, National Chi Nan University, Puli, Nantou 545, TaiwanDepartment of Electro-Optical Engineering, Minghsin University of Science and Technology, No. 1, Xinxing Road, Xinfeng, Hsinchu 30401, TaiwanDepartment of Applied Materials and Optoelectronic Engineering, National Chi Nan University, Puli, Nantou 545, TaiwanIn this study, bismuth trioxide (Bi<sub>2</sub>O<sub>3</sub>) membranes in an electrolyte–insulator–semiconductor (EIS) structure were fabricated with pH sensing capability. To optimize the sensing performance, the membranes were treated with two types of plasma—NH<sub>3</sub> and N<sub>2</sub>O. To investigate the material property improvements, multiple material characterizations were conducted. Material analysis results indicate that plasma treatments with appropriate time could enhance the crystallization, remove the silicate and facilitate crystallizations. Owing to the material optimizations, the pH sensing capability could be greatly boosted. NH<sub>3</sub> or N<sub>2</sub>O plasma treated-Bi<sub>2</sub>O<sub>3</sub> membranes could reach the pH sensitivity around 60 mV/pH and show promise for future biomedical applications.https://www.mdpi.com/2077-0375/12/2/188bismuth trioxideplasma treatmentNH<sub>3</sub> and N<sub>2</sub>Onitrogen passivationgrainization
spellingShingle Chyuan-Haur Kao
Kuan-Lin Chen
Yi-Shiang Chiu
Lin Sang Hao
Shih-Ming Chen
Ming-Hsien Li
Ming-Ling Lee
Hsiang Chen
Comparison of NH<sub>3</sub> and N<sub>2</sub>O Plasma Treatments on Bi<sub>2</sub>O<sub>3</sub> Sensing Membranes Applied in an Electrolyte–Insulator–Semiconductor Structure
Membranes
bismuth trioxide
plasma treatment
NH<sub>3</sub> and N<sub>2</sub>O
nitrogen passivation
grainization
title Comparison of NH<sub>3</sub> and N<sub>2</sub>O Plasma Treatments on Bi<sub>2</sub>O<sub>3</sub> Sensing Membranes Applied in an Electrolyte–Insulator–Semiconductor Structure
title_full Comparison of NH<sub>3</sub> and N<sub>2</sub>O Plasma Treatments on Bi<sub>2</sub>O<sub>3</sub> Sensing Membranes Applied in an Electrolyte–Insulator–Semiconductor Structure
title_fullStr Comparison of NH<sub>3</sub> and N<sub>2</sub>O Plasma Treatments on Bi<sub>2</sub>O<sub>3</sub> Sensing Membranes Applied in an Electrolyte–Insulator–Semiconductor Structure
title_full_unstemmed Comparison of NH<sub>3</sub> and N<sub>2</sub>O Plasma Treatments on Bi<sub>2</sub>O<sub>3</sub> Sensing Membranes Applied in an Electrolyte–Insulator–Semiconductor Structure
title_short Comparison of NH<sub>3</sub> and N<sub>2</sub>O Plasma Treatments on Bi<sub>2</sub>O<sub>3</sub> Sensing Membranes Applied in an Electrolyte–Insulator–Semiconductor Structure
title_sort comparison of nh sub 3 sub and n sub 2 sub o plasma treatments on bi sub 2 sub o sub 3 sub sensing membranes applied in an electrolyte insulator semiconductor structure
topic bismuth trioxide
plasma treatment
NH<sub>3</sub> and N<sub>2</sub>O
nitrogen passivation
grainization
url https://www.mdpi.com/2077-0375/12/2/188
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