Characterization of damage morphology of structural SiO2 film induced by nanosecond pulsed laser

We investigated the damage morphology of porous silicon oxide film with a periodic hexagonal hole array irradiated by nanosecond pulsed laser, both experimentally and numerically. To understand the damage morphology, the temperature field distribution and the thermal stress distribution during the l...

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Main Authors: Li Yuan, Su Junhong, Xu Junqi, Yang Guoliang
Format: Article
Language:English
Published: De Gruyter 2022-07-01
Series:Open Physics
Subjects:
Online Access:https://doi.org/10.1515/phys-2022-0060
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author Li Yuan
Su Junhong
Xu Junqi
Yang Guoliang
author_facet Li Yuan
Su Junhong
Xu Junqi
Yang Guoliang
author_sort Li Yuan
collection DOAJ
description We investigated the damage morphology of porous silicon oxide film with a periodic hexagonal hole array irradiated by nanosecond pulsed laser, both experimentally and numerically. To understand the damage morphology, the temperature field distribution and the thermal stress distribution during the laser radiation process were investigated by finite element method. The simulation results show that the thermal stress regulated by periodic structural surface is the reason for the circumferential and discrete distribution of the damage points. The results provide ideas for improving the laser damage resistance of the structural surfaces.
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spelling doaj.art-53a74b12072445e8bc5b3f113f19b6d12022-12-22T04:28:54ZengDe GruyterOpen Physics2391-54712022-07-0120172472910.1515/phys-2022-0060Characterization of damage morphology of structural SiO2 film induced by nanosecond pulsed laserLi Yuan0Su Junhong1Xu Junqi2Yang Guoliang3School of Photoelectrical Engineering, Xi’an Technological University, Xi’an 710021, ChinaSchool of Photoelectrical Engineering, Xi’an Technological University, Xi’an 710021, ChinaSchool of Photoelectrical Engineering, Xi’an Technological University, Xi’an 710021, ChinaSchool of Photoelectrical Engineering, Xi’an Technological University, Xi’an 710021, ChinaWe investigated the damage morphology of porous silicon oxide film with a periodic hexagonal hole array irradiated by nanosecond pulsed laser, both experimentally and numerically. To understand the damage morphology, the temperature field distribution and the thermal stress distribution during the laser radiation process were investigated by finite element method. The simulation results show that the thermal stress regulated by periodic structural surface is the reason for the circumferential and discrete distribution of the damage points. The results provide ideas for improving the laser damage resistance of the structural surfaces.https://doi.org/10.1515/phys-2022-0060anti-reflectionlaser damagesurface morphologyperiodic porous surfacetemperature field distributionthermal stress field distribution
spellingShingle Li Yuan
Su Junhong
Xu Junqi
Yang Guoliang
Characterization of damage morphology of structural SiO2 film induced by nanosecond pulsed laser
Open Physics
anti-reflection
laser damage
surface morphology
periodic porous surface
temperature field distribution
thermal stress field distribution
title Characterization of damage morphology of structural SiO2 film induced by nanosecond pulsed laser
title_full Characterization of damage morphology of structural SiO2 film induced by nanosecond pulsed laser
title_fullStr Characterization of damage morphology of structural SiO2 film induced by nanosecond pulsed laser
title_full_unstemmed Characterization of damage morphology of structural SiO2 film induced by nanosecond pulsed laser
title_short Characterization of damage morphology of structural SiO2 film induced by nanosecond pulsed laser
title_sort characterization of damage morphology of structural sio2 film induced by nanosecond pulsed laser
topic anti-reflection
laser damage
surface morphology
periodic porous surface
temperature field distribution
thermal stress field distribution
url https://doi.org/10.1515/phys-2022-0060
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AT sujunhong characterizationofdamagemorphologyofstructuralsio2filminducedbynanosecondpulsedlaser
AT xujunqi characterizationofdamagemorphologyofstructuralsio2filminducedbynanosecondpulsedlaser
AT yangguoliang characterizationofdamagemorphologyofstructuralsio2filminducedbynanosecondpulsedlaser