End point prediction in wet etching, cleaning, and rinsing of microstructures in semiconductor manufacturing
Etching, cleaning, and rinsing of micro- and nano-scale features are important industrial processes in semiconductor manufacturing. This study focused on developing an adaptable process simulator that employs user-input criteria drawn from literature and processing conditions to predict end point ti...
| Main Authors: | , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
Elsevier
2022-08-01
|
| Series: | Cleaner Engineering and Technology |
| Subjects: | |
| Online Access: | http://www.sciencedirect.com/science/article/pii/S2666790822001161 |