A low-cost fabrication method of nanostructures by ultraviolet proximity exposing lithography
The lithography contact/proximity printing technique is widely used in the fabrication of microelectronic components, optical devices, and micro-fluidic chips. However, the fabrication of nano-sized structures requires high-cost equipment. This paper proposes a low-cost method to manufacture nanostr...
| Main Authors: | , , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
AIP Publishing LLC
2020-04-01
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| Series: | AIP Advances |
| Online Access: | http://dx.doi.org/10.1063/5.0002942 |
| _version_ | 1819081740014059520 |
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| author | Lingpeng Liu Lei Sun Liping Qi Ran Guo Kehong Li Zhifu Yin Dongjiang Wu Helin Zou |
| author_facet | Lingpeng Liu Lei Sun Liping Qi Ran Guo Kehong Li Zhifu Yin Dongjiang Wu Helin Zou |
| author_sort | Lingpeng Liu |
| collection | DOAJ |
| description | The lithography contact/proximity printing technique is widely used in the fabrication of microelectronic components, optical devices, and micro-fluidic chips. However, the fabrication of nano-sized structures requires high-cost equipment. This paper proposes a low-cost method to manufacture nanostructures by ultraviolet proximity exposing lithography through a microphotomask on a conventional lithographic aligner. The influence of exposure distance on photoresist pattern size is studied, and the standing wave effect on the photoresist layer is reduced by post-baking. This cost effective method can be widely applied to fabricate patterns with a nanofeature size. |
| first_indexed | 2024-12-21T20:05:34Z |
| format | Article |
| id | doaj.art-54c7deb0cedb4fca9cd38b862afe9634 |
| institution | Directory Open Access Journal |
| issn | 2158-3226 |
| language | English |
| last_indexed | 2024-12-21T20:05:34Z |
| publishDate | 2020-04-01 |
| publisher | AIP Publishing LLC |
| record_format | Article |
| series | AIP Advances |
| spelling | doaj.art-54c7deb0cedb4fca9cd38b862afe96342022-12-21T18:51:51ZengAIP Publishing LLCAIP Advances2158-32262020-04-01104045221045221-510.1063/5.0002942A low-cost fabrication method of nanostructures by ultraviolet proximity exposing lithographyLingpeng Liu0Lei Sun1Liping Qi2Ran Guo3Kehong Li4Zhifu Yin5Dongjiang Wu6Helin Zou7Key Laboratory for Precision and Non-traditional Machining Technology of Ministry of Education, Dalian University of Technology, Dalian, ChinaKey Laboratory for Precision and Non-traditional Machining Technology of Ministry of Education, Dalian University of Technology, Dalian, ChinaDepartment of Biomedical Engineering, Dalian University of Technology, Dalian, ChinaKey Laboratory for Precision and Non-traditional Machining Technology of Ministry of Education, Dalian University of Technology, Dalian, ChinaKey Laboratory for Precision and Non-traditional Machining Technology of Ministry of Education, Dalian University of Technology, Dalian, ChinaSchool of Mechanical Science and Engineering, Jilin University, Changchun, ChinaKey Laboratory for Micro/Nano Technology and Systems of Liaoning Province, Dalian University of Technology, Dalian, ChinaKey Laboratory for Precision and Non-traditional Machining Technology of Ministry of Education, Dalian University of Technology, Dalian, ChinaThe lithography contact/proximity printing technique is widely used in the fabrication of microelectronic components, optical devices, and micro-fluidic chips. However, the fabrication of nano-sized structures requires high-cost equipment. This paper proposes a low-cost method to manufacture nanostructures by ultraviolet proximity exposing lithography through a microphotomask on a conventional lithographic aligner. The influence of exposure distance on photoresist pattern size is studied, and the standing wave effect on the photoresist layer is reduced by post-baking. This cost effective method can be widely applied to fabricate patterns with a nanofeature size.http://dx.doi.org/10.1063/5.0002942 |
| spellingShingle | Lingpeng Liu Lei Sun Liping Qi Ran Guo Kehong Li Zhifu Yin Dongjiang Wu Helin Zou A low-cost fabrication method of nanostructures by ultraviolet proximity exposing lithography AIP Advances |
| title | A low-cost fabrication method of nanostructures by ultraviolet proximity exposing lithography |
| title_full | A low-cost fabrication method of nanostructures by ultraviolet proximity exposing lithography |
| title_fullStr | A low-cost fabrication method of nanostructures by ultraviolet proximity exposing lithography |
| title_full_unstemmed | A low-cost fabrication method of nanostructures by ultraviolet proximity exposing lithography |
| title_short | A low-cost fabrication method of nanostructures by ultraviolet proximity exposing lithography |
| title_sort | low cost fabrication method of nanostructures by ultraviolet proximity exposing lithography |
| url | http://dx.doi.org/10.1063/5.0002942 |
| work_keys_str_mv | AT lingpengliu alowcostfabricationmethodofnanostructuresbyultravioletproximityexposinglithography AT leisun alowcostfabricationmethodofnanostructuresbyultravioletproximityexposinglithography AT lipingqi alowcostfabricationmethodofnanostructuresbyultravioletproximityexposinglithography AT ranguo alowcostfabricationmethodofnanostructuresbyultravioletproximityexposinglithography AT kehongli alowcostfabricationmethodofnanostructuresbyultravioletproximityexposinglithography AT zhifuyin alowcostfabricationmethodofnanostructuresbyultravioletproximityexposinglithography AT dongjiangwu alowcostfabricationmethodofnanostructuresbyultravioletproximityexposinglithography AT helinzou alowcostfabricationmethodofnanostructuresbyultravioletproximityexposinglithography AT lingpengliu lowcostfabricationmethodofnanostructuresbyultravioletproximityexposinglithography AT leisun lowcostfabricationmethodofnanostructuresbyultravioletproximityexposinglithography AT lipingqi lowcostfabricationmethodofnanostructuresbyultravioletproximityexposinglithography AT ranguo lowcostfabricationmethodofnanostructuresbyultravioletproximityexposinglithography AT kehongli lowcostfabricationmethodofnanostructuresbyultravioletproximityexposinglithography AT zhifuyin lowcostfabricationmethodofnanostructuresbyultravioletproximityexposinglithography AT dongjiangwu lowcostfabricationmethodofnanostructuresbyultravioletproximityexposinglithography AT helinzou lowcostfabricationmethodofnanostructuresbyultravioletproximityexposinglithography |