The Inverse Optimization of an Optical Lithographic Source with a Hybrid Genetic Algorithm

As an effective resolution enhancement technology, source optimization (SO) is considered key for significantly improving the image quality of optical lithography at advanced nodes. To solve the problem of unsatisfactory SO performance, it is necessary to combine it with optimization algorithms. In...

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Main Authors: Junbo Liu, Ji Zhou, Dajie Yu, Haifeng Sun, Song Hu, Jian Wang
Format: Article
Language:English
Published: MDPI AG 2023-05-01
Series:Applied Sciences
Subjects:
Online Access:https://www.mdpi.com/2076-3417/13/9/5708
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author Junbo Liu
Ji Zhou
Dajie Yu
Haifeng Sun
Song Hu
Jian Wang
author_facet Junbo Liu
Ji Zhou
Dajie Yu
Haifeng Sun
Song Hu
Jian Wang
author_sort Junbo Liu
collection DOAJ
description As an effective resolution enhancement technology, source optimization (SO) is considered key for significantly improving the image quality of optical lithography at advanced nodes. To solve the problem of unsatisfactory SO performance, it is necessary to combine it with optimization algorithms. In this study, an SO method based on a hybrid genetic algorithm is proposed to achieve an acceptable source shape in the imaging process for optical lithography. To overcome the problems of local optima and the small search scope, an update strategy that uses particle swarm optimization and the tabu list method from the tabu search algorithm are utilized to enhance the optimization performance. Meanwhile, different feature patterns were employed as the input of the optimization model. These simulation results show that the proposed SO method exhibits dominant optimization performance for SO in optical lithography.
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spelling doaj.art-5599cf2c252542b094f368e64594ac232023-11-17T22:37:41ZengMDPI AGApplied Sciences2076-34172023-05-01139570810.3390/app13095708The Inverse Optimization of an Optical Lithographic Source with a Hybrid Genetic AlgorithmJunbo Liu0Ji Zhou1Dajie Yu2Haifeng Sun3Song Hu4Jian Wang5National Key Laboratory of Optical Field Manipulation Science and Technology, Chengdu 610209, ChinaNational Key Laboratory of Optical Field Manipulation Science and Technology, Chengdu 610209, ChinaNational Key Laboratory of Optical Field Manipulation Science and Technology, Chengdu 610209, ChinaNational Key Laboratory of Optical Field Manipulation Science and Technology, Chengdu 610209, ChinaNational Key Laboratory of Optical Field Manipulation Science and Technology, Chengdu 610209, ChinaNational Key Laboratory of Optical Field Manipulation Science and Technology, Chengdu 610209, ChinaAs an effective resolution enhancement technology, source optimization (SO) is considered key for significantly improving the image quality of optical lithography at advanced nodes. To solve the problem of unsatisfactory SO performance, it is necessary to combine it with optimization algorithms. In this study, an SO method based on a hybrid genetic algorithm is proposed to achieve an acceptable source shape in the imaging process for optical lithography. To overcome the problems of local optima and the small search scope, an update strategy that uses particle swarm optimization and the tabu list method from the tabu search algorithm are utilized to enhance the optimization performance. Meanwhile, different feature patterns were employed as the input of the optimization model. These simulation results show that the proposed SO method exhibits dominant optimization performance for SO in optical lithography.https://www.mdpi.com/2076-3417/13/9/5708optical lithographysource optimizationgenetic algorithmresolution enhancement technology
spellingShingle Junbo Liu
Ji Zhou
Dajie Yu
Haifeng Sun
Song Hu
Jian Wang
The Inverse Optimization of an Optical Lithographic Source with a Hybrid Genetic Algorithm
Applied Sciences
optical lithography
source optimization
genetic algorithm
resolution enhancement technology
title The Inverse Optimization of an Optical Lithographic Source with a Hybrid Genetic Algorithm
title_full The Inverse Optimization of an Optical Lithographic Source with a Hybrid Genetic Algorithm
title_fullStr The Inverse Optimization of an Optical Lithographic Source with a Hybrid Genetic Algorithm
title_full_unstemmed The Inverse Optimization of an Optical Lithographic Source with a Hybrid Genetic Algorithm
title_short The Inverse Optimization of an Optical Lithographic Source with a Hybrid Genetic Algorithm
title_sort inverse optimization of an optical lithographic source with a hybrid genetic algorithm
topic optical lithography
source optimization
genetic algorithm
resolution enhancement technology
url https://www.mdpi.com/2076-3417/13/9/5708
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