The Inverse Optimization of an Optical Lithographic Source with a Hybrid Genetic Algorithm
As an effective resolution enhancement technology, source optimization (SO) is considered key for significantly improving the image quality of optical lithography at advanced nodes. To solve the problem of unsatisfactory SO performance, it is necessary to combine it with optimization algorithms. In...
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MDPI AG
2023-05-01
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Online Access: | https://www.mdpi.com/2076-3417/13/9/5708 |
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author | Junbo Liu Ji Zhou Dajie Yu Haifeng Sun Song Hu Jian Wang |
author_facet | Junbo Liu Ji Zhou Dajie Yu Haifeng Sun Song Hu Jian Wang |
author_sort | Junbo Liu |
collection | DOAJ |
description | As an effective resolution enhancement technology, source optimization (SO) is considered key for significantly improving the image quality of optical lithography at advanced nodes. To solve the problem of unsatisfactory SO performance, it is necessary to combine it with optimization algorithms. In this study, an SO method based on a hybrid genetic algorithm is proposed to achieve an acceptable source shape in the imaging process for optical lithography. To overcome the problems of local optima and the small search scope, an update strategy that uses particle swarm optimization and the tabu list method from the tabu search algorithm are utilized to enhance the optimization performance. Meanwhile, different feature patterns were employed as the input of the optimization model. These simulation results show that the proposed SO method exhibits dominant optimization performance for SO in optical lithography. |
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institution | Directory Open Access Journal |
issn | 2076-3417 |
language | English |
last_indexed | 2024-03-11T04:23:09Z |
publishDate | 2023-05-01 |
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spelling | doaj.art-5599cf2c252542b094f368e64594ac232023-11-17T22:37:41ZengMDPI AGApplied Sciences2076-34172023-05-01139570810.3390/app13095708The Inverse Optimization of an Optical Lithographic Source with a Hybrid Genetic AlgorithmJunbo Liu0Ji Zhou1Dajie Yu2Haifeng Sun3Song Hu4Jian Wang5National Key Laboratory of Optical Field Manipulation Science and Technology, Chengdu 610209, ChinaNational Key Laboratory of Optical Field Manipulation Science and Technology, Chengdu 610209, ChinaNational Key Laboratory of Optical Field Manipulation Science and Technology, Chengdu 610209, ChinaNational Key Laboratory of Optical Field Manipulation Science and Technology, Chengdu 610209, ChinaNational Key Laboratory of Optical Field Manipulation Science and Technology, Chengdu 610209, ChinaNational Key Laboratory of Optical Field Manipulation Science and Technology, Chengdu 610209, ChinaAs an effective resolution enhancement technology, source optimization (SO) is considered key for significantly improving the image quality of optical lithography at advanced nodes. To solve the problem of unsatisfactory SO performance, it is necessary to combine it with optimization algorithms. In this study, an SO method based on a hybrid genetic algorithm is proposed to achieve an acceptable source shape in the imaging process for optical lithography. To overcome the problems of local optima and the small search scope, an update strategy that uses particle swarm optimization and the tabu list method from the tabu search algorithm are utilized to enhance the optimization performance. Meanwhile, different feature patterns were employed as the input of the optimization model. These simulation results show that the proposed SO method exhibits dominant optimization performance for SO in optical lithography.https://www.mdpi.com/2076-3417/13/9/5708optical lithographysource optimizationgenetic algorithmresolution enhancement technology |
spellingShingle | Junbo Liu Ji Zhou Dajie Yu Haifeng Sun Song Hu Jian Wang The Inverse Optimization of an Optical Lithographic Source with a Hybrid Genetic Algorithm Applied Sciences optical lithography source optimization genetic algorithm resolution enhancement technology |
title | The Inverse Optimization of an Optical Lithographic Source with a Hybrid Genetic Algorithm |
title_full | The Inverse Optimization of an Optical Lithographic Source with a Hybrid Genetic Algorithm |
title_fullStr | The Inverse Optimization of an Optical Lithographic Source with a Hybrid Genetic Algorithm |
title_full_unstemmed | The Inverse Optimization of an Optical Lithographic Source with a Hybrid Genetic Algorithm |
title_short | The Inverse Optimization of an Optical Lithographic Source with a Hybrid Genetic Algorithm |
title_sort | inverse optimization of an optical lithographic source with a hybrid genetic algorithm |
topic | optical lithography source optimization genetic algorithm resolution enhancement technology |
url | https://www.mdpi.com/2076-3417/13/9/5708 |
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