Characterization of Ti/SnO<sub>2</sub> Interface by X-ray Photoelectron Spectroscopy
The Ti/SnO<sub>2</sub> interface has been investigated in situ via the technique of x-ray photoelectron spectroscopy. Thin films (in the range from 0.3 to 1.1 nm) of titanium were deposited on SnO<sub>2</sub> substrates via the e-beam technique. The deposition was carried out...
Main Authors: | , |
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Format: | Article |
Language: | English |
Published: |
MDPI AG
2022-01-01
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Series: | Nanomaterials |
Subjects: | |
Online Access: | https://www.mdpi.com/2079-4991/12/2/202 |