Characterization of Ti/SnO<sub>2</sub> Interface by X-ray Photoelectron Spectroscopy

The Ti/SnO<sub>2</sub> interface has been investigated in situ via the technique of x-ray photoelectron spectroscopy. Thin films (in the range from 0.3 to 1.1 nm) of titanium were deposited on SnO<sub>2</sub> substrates via the e-beam technique. The deposition was carried out...

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Bibliographic Details
Main Authors: Miranda Martinez, Anil R. Chourasia
Format: Article
Language:English
Published: MDPI AG 2022-01-01
Series:Nanomaterials
Subjects:
Online Access:https://www.mdpi.com/2079-4991/12/2/202