3D Micro/Nanopatterning of a Vinylferrocene Copolymer

3D Micro/Nanopatterning of a Vinylferrocene Copolymer

In nanoimprint lithography (NIL), a pattern is created by mechanical deformation of an imprint resist via embossing with a stamp, where the adhesion behavior during the filling of the imprint stamp and its subsequent detachment may impose some practical challenges. Here we explored thermal and rever...

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Bibliographic Details
Main Authors: Dennis Löber, Subhayan Dey, Burhan Kaban, Fabian Roesler, Martin Maurer, Hartmut Hillmer, Rudolf Pietschnig
Format: Article
Language:English
Published: MDPI AG 2020-05-01
Series:Molecules
Subjects:
vinylferrocene
copolymer
methyl methacrylate
reverse nanoimprint lithography
Online Access:https://www.mdpi.com/1420-3049/25/10/2438

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