Graphene removal by water-assisted focused electron-beam-induced etching – unveiling the dose and dwell time impact on the etch profile and topographical changes in SiO2 substrates
Graphene is one of the most extensively studied 2D materials, exhibiting extraordinary mechanical and electronic properties. Although many years have passed since its discovery, manipulating single graphene layers is still challenging using standard resist-based lithography techniques. Recently, it...
| Κύριοι συγγραφείς: | , , , , , , , |
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| Μορφή: | Άρθρο |
| Γλώσσα: | English |
| Έκδοση: |
Beilstein-Institut
2024-02-01
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| Σειρά: | Beilstein Journal of Nanotechnology |
| Θέματα: | |
| Διαθέσιμο Online: | https://doi.org/10.3762/bjnano.15.18 |