Growth kinetics of anodic oxide layers on cobalt silicides in sulphuric acid solutions

Growth kinetics of anodic oxide layers on cobalt silicides in sulphuric acid solutions

The aim of this research was to study the growth kinetics of anodic oxide films on cobalt silicides in sulphuric acid solutions under potentiostatic conditions with various pretreatment of the electrode surface. For the study, we used low and high silicon silicides (Co2Si and CoSi2) in 0.05...

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Bibliographic Details
Main Authors: Anatoliy B. Shein, Vladimir I. Kichigin
Format: Article
Language:English
Published: Voronezh State University 2022-12-01
Series:Конденсированные среды и межфазные границы
Subjects:
cobalt silicide
passivity
oxide film
growth kinetics
high field model
point defect model
Online Access:https://journals.vsu.ru/kcmf/article/view/10560

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