| Summary: | Owing to their surface plasmon-based operation, arrays of subwavelength holes show extraordinary electromagnetic transmission and intense field localizations of several orders of magnitude. Thus they were proposed as the basic building blocks for a number of applications utilizing the enhancement of nonlinear optical effects. We designed and simulated nanometer-sized subwavelength holes using an analytical approach. In our experiments we used the scanning probe method for nanolithographic fabrication of subwavelength hole arrays in silver layers sputtered on a positive photoresist substrate. We fabricated ordered nanohole patterns with different shapes, dispositions and proportions. The smallest width was about 60 nm. We characterized the fabricated samples by atomic force microscopy.
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