Kinetics and Mechanism of Phosphorus Removal from Silicon in Vacuum Induction Refining
Vacuum induction refining is a process that can be applied to remove phosphorus from molten silicon for the production of solar grade silicon. Pure silicon was doped by phosphorus to make molten silicon containing around 17 ppmw phosphorus. The kinetics of phosphorus removal from t...
| Main Authors: | , |
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| Format: | Article |
| Language: | English |
| Published: |
De Gruyter
2012-02-01
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| Series: | High Temperature Materials and Processes |
| Subjects: | |
| Online Access: | https://doi.org/10.1515/htmp.2011.143 |
| _version_ | 1818733705757196288 |
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| author | Safarian Jafar Tangstad Merete |
| author_facet | Safarian Jafar Tangstad Merete |
| author_sort | Safarian Jafar |
| collection | DOAJ |
| description | Vacuum induction refining is a process that
can be applied to remove phosphorus from
molten silicon for the production of solar
grade silicon. Pure silicon was doped by
phosphorus to make molten silicon containing
around 17 ppmw phosphorus. The kinetics of
phosphorus removal from this silicon was
studied at 0.5 Pa through the application of
vacuum induction refining. It was observed
that vacuum removal of phosphorus occurs
through a first-order reaction. The rate
constants of phosphorus evaporation were
determined as 2.28 ×
10-6
m/s and
4.93 ×
10-6
m/s at
1500 °C and
1600 °C,
respectively. Moreover, an apparent activation
energy 213.1 kJ/mol for
phosphorus evaporation from molten silicon was
calculated. It was found that mass transfer of
phosphorus in the melt is not rate limiting in
the inductively stirred silicon melt. The
vacuum removal of phosphorus is mix-controlled
by chemical reaction and gas phase mass
transfer. Under medium vacuum conditions, the
mass transfer in the gas phase is more
rate-limiting than the chemical reaction at
higher refining temperatures. |
| first_indexed | 2024-12-17T23:53:43Z |
| format | Article |
| id | doaj.art-588cb7b506d44cc293d47a1f341526ed |
| institution | Directory Open Access Journal |
| issn | 0334-6455 2191-0324 |
| language | English |
| last_indexed | 2024-12-17T23:53:43Z |
| publishDate | 2012-02-01 |
| publisher | De Gruyter |
| record_format | Article |
| series | High Temperature Materials and Processes |
| spelling | doaj.art-588cb7b506d44cc293d47a1f341526ed2022-12-21T21:28:07ZengDe GruyterHigh Temperature Materials and Processes0334-64552191-03242012-02-01311738110.1515/htmp.2011.143Kinetics and Mechanism of Phosphorus Removal from Silicon in Vacuum Induction RefiningSafarian Jafar0Tangstad Merete1Norwegian University of Science and Technology, Trondheim, NorwayNorwegian University of Science and Technology, Trondheim, NorwayVacuum induction refining is a process that can be applied to remove phosphorus from molten silicon for the production of solar grade silicon. Pure silicon was doped by phosphorus to make molten silicon containing around 17 ppmw phosphorus. The kinetics of phosphorus removal from this silicon was studied at 0.5 Pa through the application of vacuum induction refining. It was observed that vacuum removal of phosphorus occurs through a first-order reaction. The rate constants of phosphorus evaporation were determined as 2.28 × 10-6 m/s and 4.93 × 10-6 m/s at 1500 °C and 1600 °C, respectively. Moreover, an apparent activation energy 213.1 kJ/mol for phosphorus evaporation from molten silicon was calculated. It was found that mass transfer of phosphorus in the melt is not rate limiting in the inductively stirred silicon melt. The vacuum removal of phosphorus is mix-controlled by chemical reaction and gas phase mass transfer. Under medium vacuum conditions, the mass transfer in the gas phase is more rate-limiting than the chemical reaction at higher refining temperatures.https://doi.org/10.1515/htmp.2011.143siliconphosphoruskineticsmechanismvacuum induction refining |
| spellingShingle | Safarian Jafar Tangstad Merete Kinetics and Mechanism of Phosphorus Removal from Silicon in Vacuum Induction Refining High Temperature Materials and Processes silicon phosphorus kinetics mechanism vacuum induction refining |
| title | Kinetics and Mechanism of Phosphorus Removal from Silicon in Vacuum Induction Refining |
| title_full | Kinetics and Mechanism of Phosphorus Removal from Silicon in Vacuum Induction Refining |
| title_fullStr | Kinetics and Mechanism of Phosphorus Removal from Silicon in Vacuum Induction Refining |
| title_full_unstemmed | Kinetics and Mechanism of Phosphorus Removal from Silicon in Vacuum Induction Refining |
| title_short | Kinetics and Mechanism of Phosphorus Removal from Silicon in Vacuum Induction Refining |
| title_sort | kinetics and mechanism of phosphorus removal from silicon in vacuum induction refining |
| topic | silicon phosphorus kinetics mechanism vacuum induction refining |
| url | https://doi.org/10.1515/htmp.2011.143 |
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