Single-Walled Carbon Nanotube Dominated Micron-Wide Stripe Patterned-Based Ferroelectric Field-Effect Transistors with HfO2 Defect Control Layer

Abstract Ferroelectric field-effect transistors (FeFETs) with single-walled carbon nanotube (SWCNT) dominated micron-wide stripe patterned as channel, (Bi,Nd)4Ti3O12 films as insulator, and HfO2 films as defect control layer were developed and fabricated. The prepared SWCNT-FeFETs possess excellent...

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Main Authors: Qiuhong Tan, Qianjin Wang, Yingkai Liu, Hailong Yan, Wude Cai, Zhikun Yang
Format: Article
Language:English
Published: SpringerOpen 2018-04-01
Series:Nanoscale Research Letters
Subjects:
Online Access:http://link.springer.com/article/10.1186/s11671-018-2534-1
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author Qiuhong Tan
Qianjin Wang
Yingkai Liu
Hailong Yan
Wude Cai
Zhikun Yang
author_facet Qiuhong Tan
Qianjin Wang
Yingkai Liu
Hailong Yan
Wude Cai
Zhikun Yang
author_sort Qiuhong Tan
collection DOAJ
description Abstract Ferroelectric field-effect transistors (FeFETs) with single-walled carbon nanotube (SWCNT) dominated micron-wide stripe patterned as channel, (Bi,Nd)4Ti3O12 films as insulator, and HfO2 films as defect control layer were developed and fabricated. The prepared SWCNT-FeFETs possess excellent properties such as large channel conductance, high on/off current ratio, high channel carrier mobility, great fatigue endurance performance, and data retention. Despite its thin capacitance equivalent thickness, the gate insulator with HfO2 defect control layer shows a low leakage current density of 3.1 × 10−9 A/cm2 at a gate voltage of − 3 V.
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spelling doaj.art-589d01de094e4bde88ff17d7e994f3e32023-08-02T04:25:57ZengSpringerOpenNanoscale Research Letters1931-75731556-276X2018-04-011311710.1186/s11671-018-2534-1Single-Walled Carbon Nanotube Dominated Micron-Wide Stripe Patterned-Based Ferroelectric Field-Effect Transistors with HfO2 Defect Control LayerQiuhong Tan0Qianjin Wang1Yingkai Liu2Hailong Yan3Wude Cai4Zhikun Yang5School of Energy and Environment Science, Yunnan Normal UniversityYunnan Provincial Key Laboratory for Photoelectric Information Technology, Yunnan Normal UniversityYunnan Provincial Key Laboratory for Photoelectric Information Technology, Yunnan Normal UniversityCollege of Physics and Electronic Engineering, Xinyang Normal UniversityCollege of Physics and Electronic Information, Yunnan Normal UniversityCollege of Physics and Electronic Information, Yunnan Normal UniversityAbstract Ferroelectric field-effect transistors (FeFETs) with single-walled carbon nanotube (SWCNT) dominated micron-wide stripe patterned as channel, (Bi,Nd)4Ti3O12 films as insulator, and HfO2 films as defect control layer were developed and fabricated. The prepared SWCNT-FeFETs possess excellent properties such as large channel conductance, high on/off current ratio, high channel carrier mobility, great fatigue endurance performance, and data retention. Despite its thin capacitance equivalent thickness, the gate insulator with HfO2 defect control layer shows a low leakage current density of 3.1 × 10−9 A/cm2 at a gate voltage of − 3 V.http://link.springer.com/article/10.1186/s11671-018-2534-1Ferroelectric field-effect transistors (FeFETs)Single-walled carbon nanotube (SWCNT)Nonvolatile memoryFerroelectric film
spellingShingle Qiuhong Tan
Qianjin Wang
Yingkai Liu
Hailong Yan
Wude Cai
Zhikun Yang
Single-Walled Carbon Nanotube Dominated Micron-Wide Stripe Patterned-Based Ferroelectric Field-Effect Transistors with HfO2 Defect Control Layer
Nanoscale Research Letters
Ferroelectric field-effect transistors (FeFETs)
Single-walled carbon nanotube (SWCNT)
Nonvolatile memory
Ferroelectric film
title Single-Walled Carbon Nanotube Dominated Micron-Wide Stripe Patterned-Based Ferroelectric Field-Effect Transistors with HfO2 Defect Control Layer
title_full Single-Walled Carbon Nanotube Dominated Micron-Wide Stripe Patterned-Based Ferroelectric Field-Effect Transistors with HfO2 Defect Control Layer
title_fullStr Single-Walled Carbon Nanotube Dominated Micron-Wide Stripe Patterned-Based Ferroelectric Field-Effect Transistors with HfO2 Defect Control Layer
title_full_unstemmed Single-Walled Carbon Nanotube Dominated Micron-Wide Stripe Patterned-Based Ferroelectric Field-Effect Transistors with HfO2 Defect Control Layer
title_short Single-Walled Carbon Nanotube Dominated Micron-Wide Stripe Patterned-Based Ferroelectric Field-Effect Transistors with HfO2 Defect Control Layer
title_sort single walled carbon nanotube dominated micron wide stripe patterned based ferroelectric field effect transistors with hfo2 defect control layer
topic Ferroelectric field-effect transistors (FeFETs)
Single-walled carbon nanotube (SWCNT)
Nonvolatile memory
Ferroelectric film
url http://link.springer.com/article/10.1186/s11671-018-2534-1
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