Sub-micrometer and nanoscale imprinting on large-area foils using high-pressure underwater shock waves

Laser shock imprinting (LSI) is an emerging method for creating sub-micrometer and nanoscale reliefs on thin metal foils. This report proposes using underwater shockwaves, generated by detonating an explosive charge, for high-quality imprinting as an alternative to LSI. The nanoscale relief of a pol...

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Main Authors: Shigeru Tanaka, Kouki Hasegawa, Ivan Bataev, Akihisa Kubota, Kazuyuki Hokamoto
Format: Article
Language:English
Published: Elsevier 2021-01-01
Series:Materials & Design
Subjects:
Online Access:http://www.sciencedirect.com/science/article/pii/S0264127520308777
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author Shigeru Tanaka
Kouki Hasegawa
Ivan Bataev
Akihisa Kubota
Kazuyuki Hokamoto
author_facet Shigeru Tanaka
Kouki Hasegawa
Ivan Bataev
Akihisa Kubota
Kazuyuki Hokamoto
author_sort Shigeru Tanaka
collection DOAJ
description Laser shock imprinting (LSI) is an emerging method for creating sub-micrometer and nanoscale reliefs on thin metal foils. This report proposes using underwater shockwaves, generated by detonating an explosive charge, for high-quality imprinting as an alternative to LSI. The nanoscale relief of a polycarbonate mold with 740 nm periodic grooves was replicated on an Al foil using an underwater shockwave. Underwater detonation of a high explosive creates a shockwave with pressure ≥ 1 GPa that lasts for more than 100 ns, significantly longer than that for LSI. This provides a relief depth equal to 90% of the depth of the grooves on the mold. This mold filling efficiency is the best achieved by shock imprinting reported to date. In addition, underwater shockwaves can be used for imprinting over a large area in a single shot. Furthermore, the thickness of the Al foil can be increased in comparison to that for LSI. Using a simplified 1-D model of foil acceleration, we showed that increasing the foil thickness decreases the imprinting accuracy. This study paves new ways for large-area manufacturing of micro/nanopatterns on metals that would be especially beneficial for future applications in the fields of plasmonics and metasurfaces.
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spelling doaj.art-5af472bac6944a6e883efb7002b43ab92022-12-21T21:59:31ZengElsevierMaterials & Design0264-12752021-01-01198109341Sub-micrometer and nanoscale imprinting on large-area foils using high-pressure underwater shock wavesShigeru Tanaka0Kouki Hasegawa1Ivan Bataev2Akihisa Kubota3Kazuyuki Hokamoto4Institute of Industrial Nanomaterials (IINA), Kumamoto University, 2-39-1 Kurokami, Chuo-ku, Kumamoto-shi, Kumamoto 860-8555, JapanFaculty of Engineering, Kumamoto University, 2-39-1 Kurokami, Chuo-ku, Kumamoto-shi, Kumamoto 860-8555, JapanNovosibirsk State Technical University, Faculty of Mechanical Engineering and Technologies, K. Marks 20, Novosibirsk, 630073, RussiaGraduate School of Science and Technology, Kumamoto University, 2-39-1 Kurokami, Chuo-ku, Kumamoto 860-8555, JapanInstitute of Industrial Nanomaterials (IINA), Kumamoto University, 2-39-1 Kurokami, Chuo-ku, Kumamoto-shi, Kumamoto 860-8555, Japan; Corresponding author.Laser shock imprinting (LSI) is an emerging method for creating sub-micrometer and nanoscale reliefs on thin metal foils. This report proposes using underwater shockwaves, generated by detonating an explosive charge, for high-quality imprinting as an alternative to LSI. The nanoscale relief of a polycarbonate mold with 740 nm periodic grooves was replicated on an Al foil using an underwater shockwave. Underwater detonation of a high explosive creates a shockwave with pressure ≥ 1 GPa that lasts for more than 100 ns, significantly longer than that for LSI. This provides a relief depth equal to 90% of the depth of the grooves on the mold. This mold filling efficiency is the best achieved by shock imprinting reported to date. In addition, underwater shockwaves can be used for imprinting over a large area in a single shot. Furthermore, the thickness of the Al foil can be increased in comparison to that for LSI. Using a simplified 1-D model of foil acceleration, we showed that increasing the foil thickness decreases the imprinting accuracy. This study paves new ways for large-area manufacturing of micro/nanopatterns on metals that would be especially beneficial for future applications in the fields of plasmonics and metasurfaces.http://www.sciencedirect.com/science/article/pii/S0264127520308777NanoimprintingExplosiveUnderwater shock waveHigh strain rate
spellingShingle Shigeru Tanaka
Kouki Hasegawa
Ivan Bataev
Akihisa Kubota
Kazuyuki Hokamoto
Sub-micrometer and nanoscale imprinting on large-area foils using high-pressure underwater shock waves
Materials & Design
Nanoimprinting
Explosive
Underwater shock wave
High strain rate
title Sub-micrometer and nanoscale imprinting on large-area foils using high-pressure underwater shock waves
title_full Sub-micrometer and nanoscale imprinting on large-area foils using high-pressure underwater shock waves
title_fullStr Sub-micrometer and nanoscale imprinting on large-area foils using high-pressure underwater shock waves
title_full_unstemmed Sub-micrometer and nanoscale imprinting on large-area foils using high-pressure underwater shock waves
title_short Sub-micrometer and nanoscale imprinting on large-area foils using high-pressure underwater shock waves
title_sort sub micrometer and nanoscale imprinting on large area foils using high pressure underwater shock waves
topic Nanoimprinting
Explosive
Underwater shock wave
High strain rate
url http://www.sciencedirect.com/science/article/pii/S0264127520308777
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