Generation of high-uniformity and high-resolution Bessel beam arrays through all-dielectric metasurfaces
Bessel beam arrays are progressively attracting attention in recent years due to their remarkable non-diffracting nature and parallel manipulation capabilities in diverse applications. However, the poor phase discretization of conventional approaches such as spatial light modulators leads to low num...
| Main Authors: | , , , , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
De Gruyter
2022-01-01
|
| Series: | Nanophotonics |
| Subjects: | |
| Online Access: | https://doi.org/10.1515/nanoph-2021-0603 |
| _version_ | 1797947952926294016 |
|---|---|
| author | Chen Lei Kanwal Saima Yu Binbin Feng Jijun Tao Chunxian Wen Jing Zhang Dawei |
| author_facet | Chen Lei Kanwal Saima Yu Binbin Feng Jijun Tao Chunxian Wen Jing Zhang Dawei |
| author_sort | Chen Lei |
| collection | DOAJ |
| description | Bessel beam arrays are progressively attracting attention in recent years due to their remarkable non-diffracting nature and parallel manipulation capabilities in diverse applications. However, the poor phase discretization of conventional approaches such as spatial light modulators leads to low numerical aperture (NA) beam arrays due to the limitation imposed by the Nyquist sampling theorem and poor uniformity of the beam intensity. The key contribution of this study is to experimentally demonstrate the generation of high-uniformity and high-resolution Bessel beam arrays by utilizing all-dielectric metasurfaces. This is attained by optimizing the design of the supercell of a Dammann grating, particularly decreasing each supercell of the grating to a proper size. We demonstrate a 4 × 4 array of Bessel beams with a subwavelength transverse dimension (570 nm, ∼0.9λ) and a large NA of 0.4 for each beam in the array, while maintaining a relatively high uniformity intensity (52.40%) for the array. Additionally, the Bessel beam arrays are generated in a broadband range through the proposed all-dielectric metasurfaces. Our results are of great significance and particularly useful for applications of metasurface-based Bessel beam arrays in multidisciplinary fields such as laser fabrication, biomedical imaging, data storage, and multi-particle trapping. |
| first_indexed | 2024-04-10T21:34:49Z |
| format | Article |
| id | doaj.art-5d848bff4f8d43ebb943fcd8f3d87e15 |
| institution | Directory Open Access Journal |
| issn | 2192-8614 |
| language | English |
| last_indexed | 2024-04-10T21:34:49Z |
| publishDate | 2022-01-01 |
| publisher | De Gruyter |
| record_format | Article |
| series | Nanophotonics |
| spelling | doaj.art-5d848bff4f8d43ebb943fcd8f3d87e152023-01-19T12:46:58ZengDe GruyterNanophotonics2192-86142022-01-0111596797710.1515/nanoph-2021-0603Generation of high-uniformity and high-resolution Bessel beam arrays through all-dielectric metasurfacesChen Lei0Kanwal Saima1Yu Binbin2Feng Jijun3Tao Chunxian4Wen Jing5Zhang Dawei6Engineering Research Center of Optical Instrument and Systems, Ministry of Education and Shanghai Key Lab of Modern Optical System, University of Shanghai for Science and Technology, No. 516 Jun Gong Road, Shanghai200093, ChinaEngineering Research Center of Optical Instrument and Systems, Ministry of Education and Shanghai Key Lab of Modern Optical System, University of Shanghai for Science and Technology, No. 516 Jun Gong Road, Shanghai200093, ChinaWenzhou Institute, University of Chinese Academy of Sciences, Wenzhou, Zhejiang325000, ChinaEngineering Research Center of Optical Instrument and Systems, Ministry of Education and Shanghai Key Lab of Modern Optical System, University of Shanghai for Science and Technology, No. 516 Jun Gong Road, Shanghai200093, ChinaEngineering Research Center of Optical Instrument and Systems, Ministry of Education and Shanghai Key Lab of Modern Optical System, University of Shanghai for Science and Technology, No. 516 Jun Gong Road, Shanghai200093, ChinaEngineering Research Center of Optical Instrument and Systems, Ministry of Education and Shanghai Key Lab of Modern Optical System, University of Shanghai for Science and Technology, No. 516 Jun Gong Road, Shanghai200093, ChinaEngineering Research Center of Optical Instrument and Systems, Ministry of Education and Shanghai Key Lab of Modern Optical System, University of Shanghai for Science and Technology, No. 516 Jun Gong Road, Shanghai200093, ChinaBessel beam arrays are progressively attracting attention in recent years due to their remarkable non-diffracting nature and parallel manipulation capabilities in diverse applications. However, the poor phase discretization of conventional approaches such as spatial light modulators leads to low numerical aperture (NA) beam arrays due to the limitation imposed by the Nyquist sampling theorem and poor uniformity of the beam intensity. The key contribution of this study is to experimentally demonstrate the generation of high-uniformity and high-resolution Bessel beam arrays by utilizing all-dielectric metasurfaces. This is attained by optimizing the design of the supercell of a Dammann grating, particularly decreasing each supercell of the grating to a proper size. We demonstrate a 4 × 4 array of Bessel beams with a subwavelength transverse dimension (570 nm, ∼0.9λ) and a large NA of 0.4 for each beam in the array, while maintaining a relatively high uniformity intensity (52.40%) for the array. Additionally, the Bessel beam arrays are generated in a broadband range through the proposed all-dielectric metasurfaces. Our results are of great significance and particularly useful for applications of metasurface-based Bessel beam arrays in multidisciplinary fields such as laser fabrication, biomedical imaging, data storage, and multi-particle trapping.https://doi.org/10.1515/nanoph-2021-0603beam arraybessel beamhigh-uniformitymetasurfacenon-diffractive beamsubwavelength |
| spellingShingle | Chen Lei Kanwal Saima Yu Binbin Feng Jijun Tao Chunxian Wen Jing Zhang Dawei Generation of high-uniformity and high-resolution Bessel beam arrays through all-dielectric metasurfaces Nanophotonics beam array bessel beam high-uniformity metasurface non-diffractive beam subwavelength |
| title | Generation of high-uniformity and high-resolution Bessel beam arrays through all-dielectric metasurfaces |
| title_full | Generation of high-uniformity and high-resolution Bessel beam arrays through all-dielectric metasurfaces |
| title_fullStr | Generation of high-uniformity and high-resolution Bessel beam arrays through all-dielectric metasurfaces |
| title_full_unstemmed | Generation of high-uniformity and high-resolution Bessel beam arrays through all-dielectric metasurfaces |
| title_short | Generation of high-uniformity and high-resolution Bessel beam arrays through all-dielectric metasurfaces |
| title_sort | generation of high uniformity and high resolution bessel beam arrays through all dielectric metasurfaces |
| topic | beam array bessel beam high-uniformity metasurface non-diffractive beam subwavelength |
| url | https://doi.org/10.1515/nanoph-2021-0603 |
| work_keys_str_mv | AT chenlei generationofhighuniformityandhighresolutionbesselbeamarraysthroughalldielectricmetasurfaces AT kanwalsaima generationofhighuniformityandhighresolutionbesselbeamarraysthroughalldielectricmetasurfaces AT yubinbin generationofhighuniformityandhighresolutionbesselbeamarraysthroughalldielectricmetasurfaces AT fengjijun generationofhighuniformityandhighresolutionbesselbeamarraysthroughalldielectricmetasurfaces AT taochunxian generationofhighuniformityandhighresolutionbesselbeamarraysthroughalldielectricmetasurfaces AT wenjing generationofhighuniformityandhighresolutionbesselbeamarraysthroughalldielectricmetasurfaces AT zhangdawei generationofhighuniformityandhighresolutionbesselbeamarraysthroughalldielectricmetasurfaces |