A Study on the Resolution and Depth of Focus of ArF Immersion Photolithography

A Study on the Resolution and Depth of Focus of ArF Immersion Photolithography

In this study, the resolution and depth of focus (DOF) of the ArF immersion scanner are measured experimentally according to numerical aperture (<i>NA</i>). Based on the experiment, the theoretical trade-off relationship between the resolution and depth of focus can be confirmed and <...

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Bibliographic Details
Main Authors: Jungchul Song, Chae-Hwan Kim, Ga-Won Lee
Format: Article
Language:English
Published: MDPI AG 2022-11-01
Series:Micromachines
Subjects:
photolithography
ArF immersion
DOF
resolution
PR thickness
Online Access:https://www.mdpi.com/2072-666X/13/11/1971

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