Optical Constants and Band Gap Evolution with Phase Transition in Sub-20-nm-Thick TiO2 Films Prepared by ALD

Optical Constants and Band Gap Evolution with Phase Transition in Sub-20-nm-Thick TiO2 Films Prepared by ALD

Abstract Titanium dioxide (TiO2) ultrathin films with different thicknesses below 20 nm were grown by atomic layer deposition (ALD) on silicon substrates at 300 °C. Spectroscopic ellipsometry (SE) measurements were operated to investigate the effect of thickness on the optical properties of ultrathi...

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Bibliographic Details
Main Authors: Yue-Jie Shi, Rong-Jun Zhang, Hua Zheng, Da-Hai Li, Wei Wei, Xin Chen, Yan Sun, Yan-Feng Wei, Hong-Liang Lu, Ning Dai, Liang-Yao Chen
Format: Article
Language:English
Published: SpringerOpen 2017-03-01
Series:Nanoscale Research Letters
Subjects:
TiO2 ultrathin film
Atomic layer deposition
Spectroscopic ellipsometry
Rapid thermal annealing
Phase transition
Online Access:http://link.springer.com/article/10.1186/s11671-017-2011-2

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