Electromagnetic Behavior of Cu and Ni Nanofilms in the X-band

Currently, the presence of spurious microwave radiation is increasing in the environment, which has caused concern due to possible health problems in living beings and electromagnetic interference in electronic systems. To control this problem, studies in the materials area are taking place, aiming...

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Main Authors: Vitor Fernando de Melo Gonçalves, Erick Gabriel Ribeiro dos Anjos, Guilherme Ferreira de Melo Morgado, Tayra Rodrigues Brazil, Maurício Ribeiro Baldan, Maria Aparecida Miranda de Souza, Evandro Luís Nohara, Mirabel Cerqueira Rezende
Format: Article
Language:English
Published: Instituto de Aeronáutica e Espaço (IAE) 2023-06-01
Series:Journal of Aerospace Technology and Management
Subjects:
Online Access:https://jatm.com.br/jatm/article/view/1301
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author Vitor Fernando de Melo Gonçalves
Erick Gabriel Ribeiro dos Anjos
Guilherme Ferreira de Melo Morgado
Tayra Rodrigues Brazil
Maurício Ribeiro Baldan
Maria Aparecida Miranda de Souza
Evandro Luís Nohara
Mirabel Cerqueira Rezende
author_facet Vitor Fernando de Melo Gonçalves
Erick Gabriel Ribeiro dos Anjos
Guilherme Ferreira de Melo Morgado
Tayra Rodrigues Brazil
Maurício Ribeiro Baldan
Maria Aparecida Miranda de Souza
Evandro Luís Nohara
Mirabel Cerqueira Rezende
author_sort Vitor Fernando de Melo Gonçalves
collection DOAJ
description Currently, the presence of spurious microwave radiation is increasing in the environment, which has caused concern due to possible health problems in living beings and electromagnetic interference in electronic systems. To control this problem, studies in the materials area are taking place, aiming to attenuate the spurious radiation and meet requirements of good performance in broadband, low cost and low weight. The present work aimed to study Cu and Ni nanometric films with thicknesses of 65 and 200 nm, deposited on polyethylene terephthalate substrate by magnetron sputtering. Scanning electron microscopy with a field emission gun (FEGSEM) showed that the films produced have different morphological textures, due to the parameters used in the sputtering process and also the free energy of metals. Impedance spectroscopy measurements showed that the films have low conductivity values, due to the metallic oxides formed on the film surfaces, confirmed by X-ray diffraction, and also to the presence of defects. Electromagnetic characterization (8.2 – 12.4 GHz) showed that the Cu and Ni thin films had low performance, except the Ni_200 nm film, which showed a total shielding efficiency of about 30% in broadband. This result is promising considering the nanometric thickness of the Ni film.
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spelling doaj.art-5e46311161f04bd18d3f3163b64caeb42023-06-27T15:23:46ZengInstituto de Aeronáutica e Espaço (IAE)Journal of Aerospace Technology and Management2175-91462023-06-0115Electromagnetic Behavior of Cu and Ni Nanofilms in the X-bandVitor Fernando de Melo Gonçalves0Erick Gabriel Ribeiro dos Anjos1Guilherme Ferreira de Melo Morgado2Tayra Rodrigues Brazil3Maurício Ribeiro Baldan4Maria Aparecida Miranda de Souza5Evandro Luís Nohara6Mirabel Cerqueira Rezende7Universidade Federal de São Paulo – Instituto de Ciência e Tecnologia – Laboratório de Tecnologia de Polímeros e Biopolímeros – São José dos Campos/SP – Brazil.Universidade Federal de São Paulo – Instituto de Ciência e Tecnologia – Laboratório de Tecnologia de Polímeros e Biopolímeros –– São José dos Campos/SP – Brazil.Universidade Federal de São Paulo – Instituto de Ciência e Tecnologia – Laboratório de Tecnologia de Polímeros e Biopolímeros – São José dos Campos/SP – Brazil.Universidade Federal de São Paulo – Instituto de Ciência e Tecnologia – Laboratório de Tecnologia de Polímeros e Biopolímeros – São José dos Campos/SP – Brazil.Instituto Nacional de Pesquisas Espaciais – Laboratório Associado de Sensores e Materiais – São José dos Campos/SP – Brazil.Departamento de Ciência e Tecnologia Aeroespacial – Instituto de Aeronáutica e Espaço – Divisão de Materiais – São José dos Campos/SP – Brazil.Universidade de Taubaté – Departamento de Engenharia Mecânica – Taubaté/SP – Brazil.Universidade Federal de São Paulo – Instituto de Ciência e Tecnologia – Laboratório de Tecnologia de Polímeros e Biopolímeros – São José dos Campos/SP – Brazil. Currently, the presence of spurious microwave radiation is increasing in the environment, which has caused concern due to possible health problems in living beings and electromagnetic interference in electronic systems. To control this problem, studies in the materials area are taking place, aiming to attenuate the spurious radiation and meet requirements of good performance in broadband, low cost and low weight. The present work aimed to study Cu and Ni nanometric films with thicknesses of 65 and 200 nm, deposited on polyethylene terephthalate substrate by magnetron sputtering. Scanning electron microscopy with a field emission gun (FEGSEM) showed that the films produced have different morphological textures, due to the parameters used in the sputtering process and also the free energy of metals. Impedance spectroscopy measurements showed that the films have low conductivity values, due to the metallic oxides formed on the film surfaces, confirmed by X-ray diffraction, and also to the presence of defects. Electromagnetic characterization (8.2 – 12.4 GHz) showed that the Cu and Ni thin films had low performance, except the Ni_200 nm film, which showed a total shielding efficiency of about 30% in broadband. This result is promising considering the nanometric thickness of the Ni film. https://jatm.com.br/jatm/article/view/1301Electromagnetic shielding Energy absorption filmsThin filmsNickel coatingsCopperMagnetron sputtering
spellingShingle Vitor Fernando de Melo Gonçalves
Erick Gabriel Ribeiro dos Anjos
Guilherme Ferreira de Melo Morgado
Tayra Rodrigues Brazil
Maurício Ribeiro Baldan
Maria Aparecida Miranda de Souza
Evandro Luís Nohara
Mirabel Cerqueira Rezende
Electromagnetic Behavior of Cu and Ni Nanofilms in the X-band
Journal of Aerospace Technology and Management
Electromagnetic shielding
Energy absorption films
Thin films
Nickel coatings
Copper
Magnetron sputtering
title Electromagnetic Behavior of Cu and Ni Nanofilms in the X-band
title_full Electromagnetic Behavior of Cu and Ni Nanofilms in the X-band
title_fullStr Electromagnetic Behavior of Cu and Ni Nanofilms in the X-band
title_full_unstemmed Electromagnetic Behavior of Cu and Ni Nanofilms in the X-band
title_short Electromagnetic Behavior of Cu and Ni Nanofilms in the X-band
title_sort electromagnetic behavior of cu and ni nanofilms in the x band
topic Electromagnetic shielding
Energy absorption films
Thin films
Nickel coatings
Copper
Magnetron sputtering
url https://jatm.com.br/jatm/article/view/1301
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