| Summary: | NFinFET transistors with various fin widths (110 nm, 115 nm, and 120 nm) are put into measurements, and the data are collected. By using the modified model, the measure data is fitted. Several parameters in the formula of modified model are determined to make both the measured data and the fitting data almost as close as possible. Those parameters are listed and analyzed, including <i>k<sub>N</sub></i> (proportional to channel width and gate oxide capacitor, and inversely proportional to the channel length) <i>λ</i> (the inverse of Early Voltage), and sometimes <i>V<sub>th</sub></i> (Threshold Voltage). By <i>k<sub>N</sub></i>, the appropriate process control can be high lighted, the corresponding channel concentration can be calculated and thus many implicit physical quantities may be exploited.
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