Micro-Raman Mapping of 3C-SiC Thin Films Grown by Solid–Gas Phase Epitaxy on Si (111)

<p>Abstract</p> <p>A series of 3C-SiC films have been grown by a novel method of solid&#8211;gas phase epitaxy and studied by Raman scattering and scanning electron microscopy (SEM). It is shown that during the epitaxial growth in an atmosphere of CO, 3C-SiC films of high cryst...

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Main Authors: Kukushkin SA, Osipov AV, Feoktistov NA, Grudinkin SA, Perova TS, Wasyluk J
Format: Article
Language:English
Published: SpringerOpen 2010-01-01
Series:Nanoscale Research Letters
Subjects:
Online Access:http://dx.doi.org/10.1007/s11671-010-9670-6
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author Kukushkin SA
Osipov AV
Feoktistov NA
Grudinkin SA
Perova TS
Wasyluk J
author_facet Kukushkin SA
Osipov AV
Feoktistov NA
Grudinkin SA
Perova TS
Wasyluk J
author_sort Kukushkin SA
collection DOAJ
description <p>Abstract</p> <p>A series of 3C-SiC films have been grown by a novel method of solid&#8211;gas phase epitaxy and studied by Raman scattering and scanning electron microscopy (SEM). It is shown that during the epitaxial growth in an atmosphere of CO, 3C-SiC films of high crystalline quality, with a thickness of 20 nm up to few hundreds nanometers can be formed on a (111) Si wafer, with a simultaneous growth of voids in the silicon substrate under the SiC film. The presence of these voids has been confirmed by SEM and micro-Raman line-mapping experiments. A significant enhancement of the Raman signal was observed in SiC films grown above the voids, and the mechanisms responsible for this enhancement are discussed.</p>
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spelling doaj.art-5fb824d5d7064c4baa64a5a3c8d4a6052023-09-03T06:33:04ZengSpringerOpenNanoscale Research Letters1931-75731556-276X2010-01-015915071511Micro-Raman Mapping of 3C-SiC Thin Films Grown by Solid&#8211;Gas Phase Epitaxy on Si (111)Kukushkin SAOsipov AVFeoktistov NAGrudinkin SAPerova TSWasyluk J<p>Abstract</p> <p>A series of 3C-SiC films have been grown by a novel method of solid&#8211;gas phase epitaxy and studied by Raman scattering and scanning electron microscopy (SEM). It is shown that during the epitaxial growth in an atmosphere of CO, 3C-SiC films of high crystalline quality, with a thickness of 20 nm up to few hundreds nanometers can be formed on a (111) Si wafer, with a simultaneous growth of voids in the silicon substrate under the SiC film. The presence of these voids has been confirmed by SEM and micro-Raman line-mapping experiments. A significant enhancement of the Raman signal was observed in SiC films grown above the voids, and the mechanisms responsible for this enhancement are discussed.</p>http://dx.doi.org/10.1007/s11671-010-9670-63C-SiCVoids in SiCMicro-Raman spectroscopyMicro-Raman mapping
spellingShingle Kukushkin SA
Osipov AV
Feoktistov NA
Grudinkin SA
Perova TS
Wasyluk J
Micro-Raman Mapping of 3C-SiC Thin Films Grown by Solid&#8211;Gas Phase Epitaxy on Si (111)
Nanoscale Research Letters
3C-SiC
Voids in SiC
Micro-Raman spectroscopy
Micro-Raman mapping
title Micro-Raman Mapping of 3C-SiC Thin Films Grown by Solid&#8211;Gas Phase Epitaxy on Si (111)
title_full Micro-Raman Mapping of 3C-SiC Thin Films Grown by Solid&#8211;Gas Phase Epitaxy on Si (111)
title_fullStr Micro-Raman Mapping of 3C-SiC Thin Films Grown by Solid&#8211;Gas Phase Epitaxy on Si (111)
title_full_unstemmed Micro-Raman Mapping of 3C-SiC Thin Films Grown by Solid&#8211;Gas Phase Epitaxy on Si (111)
title_short Micro-Raman Mapping of 3C-SiC Thin Films Grown by Solid&#8211;Gas Phase Epitaxy on Si (111)
title_sort micro raman mapping of 3c sic thin films grown by solid 8211 gas phase epitaxy on si 111
topic 3C-SiC
Voids in SiC
Micro-Raman spectroscopy
Micro-Raman mapping
url http://dx.doi.org/10.1007/s11671-010-9670-6
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AT feoktistovna microramanmappingof3csicthinfilmsgrownbysolid8211gasphaseepitaxyonsi111
AT grudinkinsa microramanmappingof3csicthinfilmsgrownbysolid8211gasphaseepitaxyonsi111
AT perovats microramanmappingof3csicthinfilmsgrownbysolid8211gasphaseepitaxyonsi111
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