Sn/Pb ratio variation in spherical structures deposited on silicon surface using plasma focus
The deposition of Sn and Pb elements on top of Si surface was realized using plasma focus device. Due to the special characteristic of this type of plasma, the silicon substrate is heated by the bombardment of plasma ions, before the deposition of these elements sputtered from the anode. The deposit...
| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
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Elsevier
2023-06-01
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| Series: | Heliyon |
| Subjects: | |
| Online Access: | http://www.sciencedirect.com/science/article/pii/S2405844023043062 |
| _version_ | 1797802784898154496 |
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| author | M. Ahmad M. Akel Sh. Al-Hawat |
| author_facet | M. Ahmad M. Akel Sh. Al-Hawat |
| author_sort | M. Ahmad |
| collection | DOAJ |
| description | The deposition of Sn and Pb elements on top of Si surface was realized using plasma focus device. Due to the special characteristic of this type of plasma, the silicon substrate is heated by the bombardment of plasma ions, before the deposition of these elements sputtered from the anode. The deposition of the two elements was found to be influenced by substrate-anode distance as a consequence of surface heating. It was found that the relative amounts between the two deposited elements was not the same as their original ratio in the anode before sputtering. The ratio between Sn and Pb varies with increasing depth into the SnPb deposited on the Si substrate. Additionally, the size of micro spherical structures formed on the surface affected the ratio of the two deposited elements. The variation of the ratio is explained as result of deposition/evaporation competition influenced by the surface heating. |
| first_indexed | 2024-03-13T05:12:00Z |
| format | Article |
| id | doaj.art-62bbae4550624baea3203ce0d8970d05 |
| institution | Directory Open Access Journal |
| issn | 2405-8440 |
| language | English |
| last_indexed | 2024-03-13T05:12:00Z |
| publishDate | 2023-06-01 |
| publisher | Elsevier |
| record_format | Article |
| series | Heliyon |
| spelling | doaj.art-62bbae4550624baea3203ce0d8970d052023-06-16T05:10:20ZengElsevierHeliyon2405-84402023-06-0196e17098Sn/Pb ratio variation in spherical structures deposited on silicon surface using plasma focusM. Ahmad0M. Akel1Sh. Al-Hawat2IBA Laboratory, Physics Department, Atomic Energy Commission of Syria, P.O. Box: 6091, Damascus, Syria; Corresponding author.PF Laboratory, Physics Department, Atomic Energy Commission of Syria, P.O. Box: 6091, Damascus, SyriaPF Laboratory, Physics Department, Atomic Energy Commission of Syria, P.O. Box: 6091, Damascus, SyriaThe deposition of Sn and Pb elements on top of Si surface was realized using plasma focus device. Due to the special characteristic of this type of plasma, the silicon substrate is heated by the bombardment of plasma ions, before the deposition of these elements sputtered from the anode. The deposition of the two elements was found to be influenced by substrate-anode distance as a consequence of surface heating. It was found that the relative amounts between the two deposited elements was not the same as their original ratio in the anode before sputtering. The ratio between Sn and Pb varies with increasing depth into the SnPb deposited on the Si substrate. Additionally, the size of micro spherical structures formed on the surface affected the ratio of the two deposited elements. The variation of the ratio is explained as result of deposition/evaporation competition influenced by the surface heating.http://www.sciencedirect.com/science/article/pii/S2405844023043062Plasma focusXPSSEMTinLead |
| spellingShingle | M. Ahmad M. Akel Sh. Al-Hawat Sn/Pb ratio variation in spherical structures deposited on silicon surface using plasma focus Heliyon Plasma focus XPS SEM Tin Lead |
| title | Sn/Pb ratio variation in spherical structures deposited on silicon surface using plasma focus |
| title_full | Sn/Pb ratio variation in spherical structures deposited on silicon surface using plasma focus |
| title_fullStr | Sn/Pb ratio variation in spherical structures deposited on silicon surface using plasma focus |
| title_full_unstemmed | Sn/Pb ratio variation in spherical structures deposited on silicon surface using plasma focus |
| title_short | Sn/Pb ratio variation in spherical structures deposited on silicon surface using plasma focus |
| title_sort | sn pb ratio variation in spherical structures deposited on silicon surface using plasma focus |
| topic | Plasma focus XPS SEM Tin Lead |
| url | http://www.sciencedirect.com/science/article/pii/S2405844023043062 |
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