Present status of amorphous In–Ga–Zn–O thin-film transistors
The present status and recent research results on amorphous oxide semiconductors (AOSs) and their thin-film transistors (TFTs) are reviewed. AOSs represented by amorphous In–Ga–Zn–O (a-IGZO) are expected to be the channel material of TFTs in next-generation flat-panel displays because a-IGZO TFTs sa...
Main Author: | Toshio Kamiya, Kenji Nomura and Hideo Hosono |
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Format: | Article |
Language: | English |
Published: |
Taylor & Francis Group
2010-01-01
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Series: | Science and Technology of Advanced Materials |
Online Access: | http://iopscience.iop.org/1468-6996/11/4/044305 |
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