Application of Cl2/BCl3/Ar Plasma Treatment in the Improvement of Ti/Al/Mo/Au Ohmic Contacts

Application of Cl2/BCl3/Ar Plasma Treatment in the Improvement of Ti/Al/Mo/Au Ohmic Contacts

Significant improvement of Ti/Al/Mo/Au ohmic contacts deposited on previously Cl2/BCl3/Ar plasma treated surface was observed. The standard deviation of contact resistance was crucially reduced due to the incorporation of Cl2/BCl3/Ar plasma treatment. The Cl2:BCl3:Ar gas mixture was used in order to...

Full description

Bibliographic Details
Main Authors: Jacek Gryglewicz, Wojciech Macherzynski, Andrzej Stafiniak, Bogdan Paszkiewicz, Regina Paszkiewicz
Format: Article
Language:English
Published: VSB-Technical University of Ostrava 2016-01-01
Series:Advances in Electrical and Electronic Engineering
Subjects:
algan
gan
ohmic metallization
recess
ti/al/mo/au.
Online Access:http://advances.utc.sk/index.php/AEEE/article/view/1589

Similar Items

Similar Items