Progress in Polyhedral Oligomeric Silsesquioxane (POSS) Photoresists: A Comprehensive Review across Lithographic Systems
This paper offers a comprehensive overview of the polyhedral oligomeric silsesquioxane (POSS) and POSS-based composites within the realm of photoresist resin. The study involves a systematic exploration and discussion of the contributions made by POSS across various lithographic systems, with specif...
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| Format: | Article |
| Language: | English |
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MDPI AG
2024-03-01
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| Series: | Polymers |
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| Online Access: | https://www.mdpi.com/2073-4360/16/6/846 |
| _version_ | 1797239516059140096 |
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| author | Zaoxia Wen Xingyu Liu Wenxiu Chen Ruolin Zhou Hao Wu Yongmei Xia Lianbin Wu |
| author_facet | Zaoxia Wen Xingyu Liu Wenxiu Chen Ruolin Zhou Hao Wu Yongmei Xia Lianbin Wu |
| author_sort | Zaoxia Wen |
| collection | DOAJ |
| description | This paper offers a comprehensive overview of the polyhedral oligomeric silsesquioxane (POSS) and POSS-based composites within the realm of photoresist resin. The study involves a systematic exploration and discussion of the contributions made by POSS across various lithographic systems, with specific emphasis on critical parameters such as film formation, sensitivity, resolution, solubility, and edge roughness. These lithographic systems encompass X-ray lithography (XRL), deep ultraviolet nanoimprint lithography (DUV-NIL), extreme ultraviolet lithography (EUV), and guided self-assembled lithography (DSA). The principal objective of this paper is to furnish valuable insights into the development and utilization of POSS-based photoresist materials in diverse lithographic contexts. |
| first_indexed | 2024-04-24T17:52:46Z |
| format | Article |
| id | doaj.art-64c5df84439649d48f33b4937d70da87 |
| institution | Directory Open Access Journal |
| issn | 2073-4360 |
| language | English |
| last_indexed | 2024-04-24T17:52:46Z |
| publishDate | 2024-03-01 |
| publisher | MDPI AG |
| record_format | Article |
| series | Polymers |
| spelling | doaj.art-64c5df84439649d48f33b4937d70da872024-03-27T14:01:29ZengMDPI AGPolymers2073-43602024-03-0116684610.3390/polym16060846Progress in Polyhedral Oligomeric Silsesquioxane (POSS) Photoresists: A Comprehensive Review across Lithographic SystemsZaoxia Wen0Xingyu Liu1Wenxiu Chen2Ruolin Zhou3Hao Wu4Yongmei Xia5Lianbin Wu6College of Material Chemistry and Chemical Engineering, Key Laboratory of Organosilicon Chemistry and Material Technology of Zhejiang Province, Key Laboratory of Organosilicon Material Technology, Ministry of Education, Hangzhou Normal University, Hangzhou 311121, ChinaCollege of Material Chemistry and Chemical Engineering, Key Laboratory of Organosilicon Chemistry and Material Technology of Zhejiang Province, Key Laboratory of Organosilicon Material Technology, Ministry of Education, Hangzhou Normal University, Hangzhou 311121, ChinaCollege of Material Chemistry and Chemical Engineering, Key Laboratory of Organosilicon Chemistry and Material Technology of Zhejiang Province, Key Laboratory of Organosilicon Material Technology, Ministry of Education, Hangzhou Normal University, Hangzhou 311121, ChinaCollege of Material Chemistry and Chemical Engineering, Key Laboratory of Organosilicon Chemistry and Material Technology of Zhejiang Province, Key Laboratory of Organosilicon Material Technology, Ministry of Education, Hangzhou Normal University, Hangzhou 311121, ChinaCollege of Material Chemistry and Chemical Engineering, Key Laboratory of Organosilicon Chemistry and Material Technology of Zhejiang Province, Key Laboratory of Organosilicon Material Technology, Ministry of Education, Hangzhou Normal University, Hangzhou 311121, ChinaCollege of Material Chemistry and Chemical Engineering, Key Laboratory of Organosilicon Chemistry and Material Technology of Zhejiang Province, Key Laboratory of Organosilicon Material Technology, Ministry of Education, Hangzhou Normal University, Hangzhou 311121, ChinaCollege of Material Chemistry and Chemical Engineering, Key Laboratory of Organosilicon Chemistry and Material Technology of Zhejiang Province, Key Laboratory of Organosilicon Material Technology, Ministry of Education, Hangzhou Normal University, Hangzhou 311121, ChinaThis paper offers a comprehensive overview of the polyhedral oligomeric silsesquioxane (POSS) and POSS-based composites within the realm of photoresist resin. The study involves a systematic exploration and discussion of the contributions made by POSS across various lithographic systems, with specific emphasis on critical parameters such as film formation, sensitivity, resolution, solubility, and edge roughness. These lithographic systems encompass X-ray lithography (XRL), deep ultraviolet nanoimprint lithography (DUV-NIL), extreme ultraviolet lithography (EUV), and guided self-assembled lithography (DSA). The principal objective of this paper is to furnish valuable insights into the development and utilization of POSS-based photoresist materials in diverse lithographic contexts.https://www.mdpi.com/2073-4360/16/6/846photoresist resinpolyhedral oligomeric silsesquioxane (POSS)POSS-based photoresistlithographic systems |
| spellingShingle | Zaoxia Wen Xingyu Liu Wenxiu Chen Ruolin Zhou Hao Wu Yongmei Xia Lianbin Wu Progress in Polyhedral Oligomeric Silsesquioxane (POSS) Photoresists: A Comprehensive Review across Lithographic Systems Polymers photoresist resin polyhedral oligomeric silsesquioxane (POSS) POSS-based photoresist lithographic systems |
| title | Progress in Polyhedral Oligomeric Silsesquioxane (POSS) Photoresists: A Comprehensive Review across Lithographic Systems |
| title_full | Progress in Polyhedral Oligomeric Silsesquioxane (POSS) Photoresists: A Comprehensive Review across Lithographic Systems |
| title_fullStr | Progress in Polyhedral Oligomeric Silsesquioxane (POSS) Photoresists: A Comprehensive Review across Lithographic Systems |
| title_full_unstemmed | Progress in Polyhedral Oligomeric Silsesquioxane (POSS) Photoresists: A Comprehensive Review across Lithographic Systems |
| title_short | Progress in Polyhedral Oligomeric Silsesquioxane (POSS) Photoresists: A Comprehensive Review across Lithographic Systems |
| title_sort | progress in polyhedral oligomeric silsesquioxane poss photoresists a comprehensive review across lithographic systems |
| topic | photoresist resin polyhedral oligomeric silsesquioxane (POSS) POSS-based photoresist lithographic systems |
| url | https://www.mdpi.com/2073-4360/16/6/846 |
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