Progress in Polyhedral Oligomeric Silsesquioxane (POSS) Photoresists: A Comprehensive Review across Lithographic Systems

Progress in Polyhedral Oligomeric Silsesquioxane (POSS) Photoresists: A Comprehensive Review across Lithographic Systems

This paper offers a comprehensive overview of the polyhedral oligomeric silsesquioxane (POSS) and POSS-based composites within the realm of photoresist resin. The study involves a systematic exploration and discussion of the contributions made by POSS across various lithographic systems, with specif...

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Bibliographic Details
Main Authors:	Zaoxia Wen, Xingyu Liu, Wenxiu Chen, Ruolin Zhou, Hao Wu, Yongmei Xia, Lianbin Wu
Format:	Article
Language:	English
Published:	MDPI AG 2024-03-01
Series:	Polymers
Subjects:	photoresist resin polyhedral oligomeric silsesquioxane (POSS) POSS-based photoresist lithographic systems
Online Access:	https://www.mdpi.com/2073-4360/16/6/846

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