Growth technology for ZnSe single crystals with low dislocation density

The influence of the growth temperature, undercooling, growth rate as well as growth chamber construction and furnace temperature profile on the structural perfection of the crystals grown by both physical and chemical vapors transport has been investigated. The conditions for growing of crystals...

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Main Authors: Colibaba, Gleb, Nedeoglo, Dumitru
Format: Article
Language:English
Published: D.Ghitu Institute of Electronic Engineering and Nanotechnologies 2008-02-01
Series:Moldavian Journal of the Physical Sciences
Online Access:https://mjps.nanotech.md/archive/2008/article/3757
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author Colibaba, Gleb
Nedeoglo, Dumitru
author_facet Colibaba, Gleb
Nedeoglo, Dumitru
author_sort Colibaba, Gleb
collection DOAJ
description The influence of the growth temperature, undercooling, growth rate as well as growth chamber construction and furnace temperature profile on the structural perfection of the crystals grown by both physical and chemical vapors transport has been investigated. The conditions for growing of crystals free from subgrain boundaries and twins are suggested. The etch pits are not observed in the basic volume (up to 4 сm ) of grown crystals. It is shown, that PL spectra of as-grown ZnSe crystals consist of the edge radiation only. The resistivity of ZnSe crystals annealed in a Zn melt is higher than 10 Ohm⋅cm, whereas the electrical conductivity of ZnSe:I crystals grown by chemical vapor transport and annealed in a Zn melt is 10 (Ohm⋅cm) at room temperature.
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spelling doaj.art-6600da8db2af4668ad694e653378d0eb2022-12-21T21:09:34ZengD.Ghitu Institute of Electronic Engineering and NanotechnologiesMoldavian Journal of the Physical Sciences1810-648X2537-63652008-02-017126313757Growth technology for ZnSe single crystals with low dislocation densityColibaba, GlebNedeoglo, DumitruThe influence of the growth temperature, undercooling, growth rate as well as growth chamber construction and furnace temperature profile on the structural perfection of the crystals grown by both physical and chemical vapors transport has been investigated. The conditions for growing of crystals free from subgrain boundaries and twins are suggested. The etch pits are not observed in the basic volume (up to 4 сm ) of grown crystals. It is shown, that PL spectra of as-grown ZnSe crystals consist of the edge radiation only. The resistivity of ZnSe crystals annealed in a Zn melt is higher than 10 Ohm⋅cm, whereas the electrical conductivity of ZnSe:I crystals grown by chemical vapor transport and annealed in a Zn melt is 10 (Ohm⋅cm) at room temperature.https://mjps.nanotech.md/archive/2008/article/3757
spellingShingle Colibaba, Gleb
Nedeoglo, Dumitru
Growth technology for ZnSe single crystals with low dislocation density
Moldavian Journal of the Physical Sciences
title Growth technology for ZnSe single crystals with low dislocation density
title_full Growth technology for ZnSe single crystals with low dislocation density
title_fullStr Growth technology for ZnSe single crystals with low dislocation density
title_full_unstemmed Growth technology for ZnSe single crystals with low dislocation density
title_short Growth technology for ZnSe single crystals with low dislocation density
title_sort growth technology for znse single crystals with low dislocation density
url https://mjps.nanotech.md/archive/2008/article/3757
work_keys_str_mv AT colibabagleb growthtechnologyforznsesinglecrystalswithlowdislocationdensity
AT nedeoglodumitru growthtechnologyforznsesinglecrystalswithlowdislocationdensity