Sub-Wavelength Scale Si Inverted Pyramid Fabrication with Enhanced Size Control by Using Silica Sphere Lithography Technique
In this paper, we present a novel silicon (Si) subwavelength-scale surface structure (SWSS) fabrication process using the silica sphere (SS) lithography technique, which allows controllable geometries. The process involves a new cost-effective solvent-controlled spin-coating method that deposits SS...
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| Format: | Article |
| Language: | English |
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MDPI AG
2018-09-01
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| Series: | Applied Sciences |
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| Online Access: | http://www.mdpi.com/2076-3417/8/10/1720 |
| _version_ | 1811234737852776448 |
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| author | Jea-Young Choi Christiana B. Honsberg |
| author_facet | Jea-Young Choi Christiana B. Honsberg |
| author_sort | Jea-Young Choi |
| collection | DOAJ |
| description | In this paper, we present a novel silicon (Si) subwavelength-scale surface structure (SWSS) fabrication process using the silica sphere (SS) lithography technique, which allows controllable geometries. The process involves a new cost-effective solvent-controlled spin-coating method that deposits SS on large Si surface areas with enhanced SS monolayer coverage and uniformity compared to conventional methods. The larger areas and rapid, low cost processing allow colloidal sphere lithography to be realistically used for solar cells. We successfully demonstrate 1.57 μm diameter SS on a 2-inch round Si wafer with more than 95% SS monolayer coverage and great uniformity. Using these deposited SS, a SWSS fabrication process was designed and successfully demonstrated Si inverted pyramid structures with dimension on the order of 1.1 μm, thus potentially providing a new technique for effective light-management of thin crystalline Si solar cells. |
| first_indexed | 2024-04-12T11:40:48Z |
| format | Article |
| id | doaj.art-6684046504b0484fa3b8da861d3a0464 |
| institution | Directory Open Access Journal |
| issn | 2076-3417 |
| language | English |
| last_indexed | 2024-04-12T11:40:48Z |
| publishDate | 2018-09-01 |
| publisher | MDPI AG |
| record_format | Article |
| series | Applied Sciences |
| spelling | doaj.art-6684046504b0484fa3b8da861d3a04642022-12-22T03:34:39ZengMDPI AGApplied Sciences2076-34172018-09-01810172010.3390/app8101720app8101720Sub-Wavelength Scale Si Inverted Pyramid Fabrication with Enhanced Size Control by Using Silica Sphere Lithography TechniqueJea-Young Choi0Christiana B. Honsberg1Department of Materials Science and Engineering, Dong-A University, Saha-gu, Busan 604-714, KoreaSchool of Electrical, Computer and Energy Engineering, Arizona State University, Tempe, AZ 85287, USAIn this paper, we present a novel silicon (Si) subwavelength-scale surface structure (SWSS) fabrication process using the silica sphere (SS) lithography technique, which allows controllable geometries. The process involves a new cost-effective solvent-controlled spin-coating method that deposits SS on large Si surface areas with enhanced SS monolayer coverage and uniformity compared to conventional methods. The larger areas and rapid, low cost processing allow colloidal sphere lithography to be realistically used for solar cells. We successfully demonstrate 1.57 μm diameter SS on a 2-inch round Si wafer with more than 95% SS monolayer coverage and great uniformity. Using these deposited SS, a SWSS fabrication process was designed and successfully demonstrated Si inverted pyramid structures with dimension on the order of 1.1 μm, thus potentially providing a new technique for effective light-management of thin crystalline Si solar cells.http://www.mdpi.com/2076-3417/8/10/1720inverted pyramidsilica sphere lithographysub-wavelengthspin-coatingsolar cell |
| spellingShingle | Jea-Young Choi Christiana B. Honsberg Sub-Wavelength Scale Si Inverted Pyramid Fabrication with Enhanced Size Control by Using Silica Sphere Lithography Technique Applied Sciences inverted pyramid silica sphere lithography sub-wavelength spin-coating solar cell |
| title | Sub-Wavelength Scale Si Inverted Pyramid Fabrication with Enhanced Size Control by Using Silica Sphere Lithography Technique |
| title_full | Sub-Wavelength Scale Si Inverted Pyramid Fabrication with Enhanced Size Control by Using Silica Sphere Lithography Technique |
| title_fullStr | Sub-Wavelength Scale Si Inverted Pyramid Fabrication with Enhanced Size Control by Using Silica Sphere Lithography Technique |
| title_full_unstemmed | Sub-Wavelength Scale Si Inverted Pyramid Fabrication with Enhanced Size Control by Using Silica Sphere Lithography Technique |
| title_short | Sub-Wavelength Scale Si Inverted Pyramid Fabrication with Enhanced Size Control by Using Silica Sphere Lithography Technique |
| title_sort | sub wavelength scale si inverted pyramid fabrication with enhanced size control by using silica sphere lithography technique |
| topic | inverted pyramid silica sphere lithography sub-wavelength spin-coating solar cell |
| url | http://www.mdpi.com/2076-3417/8/10/1720 |
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