Sub-Wavelength Scale Si Inverted Pyramid Fabrication with Enhanced Size Control by Using Silica Sphere Lithography Technique

Sub-Wavelength Scale Si Inverted Pyramid Fabrication with Enhanced Size Control by Using Silica Sphere Lithography Technique

In this paper, we present a novel silicon (Si) subwavelength-scale surface structure (SWSS) fabrication process using the silica sphere (SS) lithography technique, which allows controllable geometries. The process involves a new cost-effective solvent-controlled spin-coating method that deposits SS...

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Bibliographic Details
Main Authors: Jea-Young Choi, Christiana B. Honsberg
Format: Article
Language:English
Published: MDPI AG 2018-09-01
Series:Applied Sciences
Subjects:
inverted pyramid
silica sphere lithography
sub-wavelength
spin-coating
solar cell
Online Access:http://www.mdpi.com/2076-3417/8/10/1720

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