Kelvin probe force microscopy for local characterisation of active nanoelectronic devices
Frequency modulated Kelvin probe force microscopy (FM-KFM) is the method of choice for high resolution measurements of local surface potentials, yet on coarse topographic structures most researchers revert to amplitude modulated lift-mode techniques for better stability. This approach inevitably tra...
Main Authors: | Tino Wagner, Hannes Beyer, Patrick Reissner, Philipp Mensch, Heike Riel, Bernd Gotsmann, Andreas Stemmer |
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Format: | Article |
Language: | English |
Published: |
Beilstein-Institut
2015-11-01
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Series: | Beilstein Journal of Nanotechnology |
Subjects: | |
Online Access: | https://doi.org/10.3762/bjnano.6.225 |
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