Ultra-high oxidation resistance of nano-structured thin films
Diffusion driven high-temperature oxidation is one of the most important failure mechanisms of protective thin films in industrial applications. Within this study, we investigated the diffusion of oxygen at 800 to 1100 °C through nano-laminated crystalline Ti-Al-N and amorphous Mo-Si-B based multila...
| Main Authors: | , , , , , , , , |
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| Format: | Article |
| Language: | English |
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Elsevier
2021-03-01
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| Series: | Materials & Design |
| Subjects: | |
| Online Access: | http://www.sciencedirect.com/science/article/pii/S0264127521000526 |
| _version_ | 1818877888472023040 |
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| author | E. Aschauer T. Wojcik P. Polcik O. Hunold M. Arndt V. Dalbauer P.H. Mayrhofer P. Felfer H. Riedl |
| author_facet | E. Aschauer T. Wojcik P. Polcik O. Hunold M. Arndt V. Dalbauer P.H. Mayrhofer P. Felfer H. Riedl |
| author_sort | E. Aschauer |
| collection | DOAJ |
| description | Diffusion driven high-temperature oxidation is one of the most important failure mechanisms of protective thin films in industrial applications. Within this study, we investigated the diffusion of oxygen at 800 to 1100 °C through nano-laminated crystalline Ti-Al-N and amorphous Mo-Si-B based multilayer coatings. The most prominent oxygen diffusion pathways, and hence the weakest points for oxidation, were identified by combining 18O tracer diffusion and atom probe tomography. An oxygen inward diffusion along column boundaries within Ti-Al-N layers in front of a visually prevalent oxidation front could be proven, highlighting the importance of these fast diffusion pathways. Furthermore, the amorphous Mo-Si-B layers act as barriers and therefore mitigate the migration of oxygen by accumulating reactive O species at a nanoscale range. Preventing oxygen diffusion along column boundaries – through the implementation of amorphous interlayers – lead to paralinear oxidation behavior and stable scales even after 7 h at 1100 °C. Our results provide a detailed insight on the importance of morphological features such as grain and column boundaries during high-temperature oxidation of protective thin films, in addition to their chemistry. |
| first_indexed | 2024-12-19T14:05:26Z |
| format | Article |
| id | doaj.art-67a1c18bc4bd41a5a6c3ecd7f9038b73 |
| institution | Directory Open Access Journal |
| issn | 0264-1275 |
| language | English |
| last_indexed | 2024-12-19T14:05:26Z |
| publishDate | 2021-03-01 |
| publisher | Elsevier |
| record_format | Article |
| series | Materials & Design |
| spelling | doaj.art-67a1c18bc4bd41a5a6c3ecd7f9038b732022-12-21T20:18:19ZengElsevierMaterials & Design0264-12752021-03-01201109499Ultra-high oxidation resistance of nano-structured thin filmsE. Aschauer0T. Wojcik1P. Polcik2O. Hunold3M. Arndt4V. Dalbauer5P.H. Mayrhofer6P. Felfer7H. Riedl8Christian Doppler Laboratory for Surface Engineering of high-performance Components, TU, Wien, Austria; Corresponding author.Institute of Materials Science and Technology, TU Wien, 1060 Wien, AustriaPlansee Composite Materials GmbH, 86983 Lechbruck am See, GermanyOerlikon Balzers, Oerlikon Surface Solutions AG, 9496 Balzers, LiechtensteinOerlikon Balzers, Oerlikon Surface Solutions AG, 9496 Balzers, LiechtensteinDepartment of Materials Science, Friedrich-Alexander-Universität Erlangen-Nürnberg, 91058 Erlangen, GermanyInstitute of Materials Science and Technology, TU Wien, 1060 Wien, AustriaDepartment of Materials Science, Friedrich-Alexander-Universität Erlangen-Nürnberg, 91058 Erlangen, GermanyChristian Doppler Laboratory for Surface Engineering of high-performance Components, TU, Wien, Austria; Institute of Materials Science and Technology, TU Wien, 1060 Wien, AustriaDiffusion driven high-temperature oxidation is one of the most important failure mechanisms of protective thin films in industrial applications. Within this study, we investigated the diffusion of oxygen at 800 to 1100 °C through nano-laminated crystalline Ti-Al-N and amorphous Mo-Si-B based multilayer coatings. The most prominent oxygen diffusion pathways, and hence the weakest points for oxidation, were identified by combining 18O tracer diffusion and atom probe tomography. An oxygen inward diffusion along column boundaries within Ti-Al-N layers in front of a visually prevalent oxidation front could be proven, highlighting the importance of these fast diffusion pathways. Furthermore, the amorphous Mo-Si-B layers act as barriers and therefore mitigate the migration of oxygen by accumulating reactive O species at a nanoscale range. Preventing oxygen diffusion along column boundaries – through the implementation of amorphous interlayers – lead to paralinear oxidation behavior and stable scales even after 7 h at 1100 °C. Our results provide a detailed insight on the importance of morphological features such as grain and column boundaries during high-temperature oxidation of protective thin films, in addition to their chemistry.http://www.sciencedirect.com/science/article/pii/S0264127521000526Oxidation MechanismTi-Al-NFast Diffusion PathwaysAPTTracer Diffusion |
| spellingShingle | E. Aschauer T. Wojcik P. Polcik O. Hunold M. Arndt V. Dalbauer P.H. Mayrhofer P. Felfer H. Riedl Ultra-high oxidation resistance of nano-structured thin films Materials & Design Oxidation Mechanism Ti-Al-N Fast Diffusion Pathways APT Tracer Diffusion |
| title | Ultra-high oxidation resistance of nano-structured thin films |
| title_full | Ultra-high oxidation resistance of nano-structured thin films |
| title_fullStr | Ultra-high oxidation resistance of nano-structured thin films |
| title_full_unstemmed | Ultra-high oxidation resistance of nano-structured thin films |
| title_short | Ultra-high oxidation resistance of nano-structured thin films |
| title_sort | ultra high oxidation resistance of nano structured thin films |
| topic | Oxidation Mechanism Ti-Al-N Fast Diffusion Pathways APT Tracer Diffusion |
| url | http://www.sciencedirect.com/science/article/pii/S0264127521000526 |
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