Ultra-high oxidation resistance of nano-structured thin films

Ultra-high oxidation resistance of nano-structured thin films

Diffusion driven high-temperature oxidation is one of the most important failure mechanisms of protective thin films in industrial applications. Within this study, we investigated the diffusion of oxygen at 800 to 1100 °C through nano-laminated crystalline Ti-Al-N and amorphous Mo-Si-B based multila...

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Bibliographic Details
Main Authors:	E. Aschauer, T. Wojcik, P. Polcik, O. Hunold, M. Arndt, V. Dalbauer, P.H. Mayrhofer, P. Felfer, H. Riedl
Format:	Article
Language:	English
Published:	Elsevier 2021-03-01
Series:	Materials & Design
Subjects:	Oxidation Mechanism Ti-Al-N Fast Diffusion Pathways APT Tracer Diffusion
Online Access:	http://www.sciencedirect.com/science/article/pii/S0264127521000526

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