Expanding 3D Nanoprinting Performance by Blurring the Electron Beam
Additive, direct-write manufacturing via a focused electron beam has evolved into a reliable 3D nanoprinting technology in recent years. Aside from low demands on substrate materials and surface morphologies, this technology allows the fabrication of freestanding, 3D architectures with feature sizes...
| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2021-01-01
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| Series: | Micromachines |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2072-666X/12/2/115 |
| _version_ | 1797408371817578496 |
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| author | Lukas Matthias Seewald Robert Winkler Gerald Kothleitner Harald Plank |
| author_facet | Lukas Matthias Seewald Robert Winkler Gerald Kothleitner Harald Plank |
| author_sort | Lukas Matthias Seewald |
| collection | DOAJ |
| description | Additive, direct-write manufacturing via a focused electron beam has evolved into a reliable 3D nanoprinting technology in recent years. Aside from low demands on substrate materials and surface morphologies, this technology allows the fabrication of freestanding, 3D architectures with feature sizes down to the sub-20 nm range. While indispensably needed for some concepts (e.g., 3D nano-plasmonics), the final applications can also be limited due to low mechanical rigidity, and thermal- or electric conductivities. To optimize these properties, without changing the overall 3D architecture, a controlled method for tuning individual branch diameters is desirable. Following this motivation, here, we introduce on-purpose beam blurring for controlled upward scaling and study the behavior at different inclination angles. The study reveals a massive boost in growth efficiencies up to a factor of five and the strong delay of unwanted proximal growth. In doing so, this work expands the design flexibility of this technology. |
| first_indexed | 2024-03-09T03:57:30Z |
| format | Article |
| id | doaj.art-67af810dddf3439ea227b67cdc581076 |
| institution | Directory Open Access Journal |
| issn | 2072-666X |
| language | English |
| last_indexed | 2024-03-09T03:57:30Z |
| publishDate | 2021-01-01 |
| publisher | MDPI AG |
| record_format | Article |
| series | Micromachines |
| spelling | doaj.art-67af810dddf3439ea227b67cdc5810762023-12-03T14:18:05ZengMDPI AGMicromachines2072-666X2021-01-0112211510.3390/mi12020115Expanding 3D Nanoprinting Performance by Blurring the Electron BeamLukas Matthias Seewald0Robert Winkler1Gerald Kothleitner2Harald Plank3Christian Doppler Laboratory for Direct-Write Fabrication of 3D Nano-Probes, Institute of Electron Microscopy and Nanoanalysis, Graz University of Technology, 8010 Graz, AustriaChristian Doppler Laboratory for Direct-Write Fabrication of 3D Nano-Probes, Institute of Electron Microscopy and Nanoanalysis, Graz University of Technology, 8010 Graz, AustriaGraz Centre for Electron Microscopy, Steyrergasse 17, 8010 Graz, AustriaChristian Doppler Laboratory for Direct-Write Fabrication of 3D Nano-Probes, Institute of Electron Microscopy and Nanoanalysis, Graz University of Technology, 8010 Graz, AustriaAdditive, direct-write manufacturing via a focused electron beam has evolved into a reliable 3D nanoprinting technology in recent years. Aside from low demands on substrate materials and surface morphologies, this technology allows the fabrication of freestanding, 3D architectures with feature sizes down to the sub-20 nm range. While indispensably needed for some concepts (e.g., 3D nano-plasmonics), the final applications can also be limited due to low mechanical rigidity, and thermal- or electric conductivities. To optimize these properties, without changing the overall 3D architecture, a controlled method for tuning individual branch diameters is desirable. Following this motivation, here, we introduce on-purpose beam blurring for controlled upward scaling and study the behavior at different inclination angles. The study reveals a massive boost in growth efficiencies up to a factor of five and the strong delay of unwanted proximal growth. In doing so, this work expands the design flexibility of this technology.https://www.mdpi.com/2072-666X/12/2/1153D-nanoprintingadditive manufacturingdirect-write manufacturingmetallic nanostructureshelicesnanowires |
| spellingShingle | Lukas Matthias Seewald Robert Winkler Gerald Kothleitner Harald Plank Expanding 3D Nanoprinting Performance by Blurring the Electron Beam Micromachines 3D-nanoprinting additive manufacturing direct-write manufacturing metallic nanostructures helices nanowires |
| title | Expanding 3D Nanoprinting Performance by Blurring the Electron Beam |
| title_full | Expanding 3D Nanoprinting Performance by Blurring the Electron Beam |
| title_fullStr | Expanding 3D Nanoprinting Performance by Blurring the Electron Beam |
| title_full_unstemmed | Expanding 3D Nanoprinting Performance by Blurring the Electron Beam |
| title_short | Expanding 3D Nanoprinting Performance by Blurring the Electron Beam |
| title_sort | expanding 3d nanoprinting performance by blurring the electron beam |
| topic | 3D-nanoprinting additive manufacturing direct-write manufacturing metallic nanostructures helices nanowires |
| url | https://www.mdpi.com/2072-666X/12/2/115 |
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