Partial Parabolic Single Layer Crossing for Silicon-on-Insulator Nanophotonic Waveguides

Under the dimension of 6 µm overall length, a 220 nm partial parabolic taper fabricated on silicon-on-insulator (SOI) wafer with 2 µm buried oxide at 1.55 µm, to simply fabrication processes and reduce cost, we design a Partial parabolic single layer crossing, which...

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Main Authors: Yuan-Ting Shih, Kuo-Fang Chung, Ding-Wei Huang
Format: Article
Language:English
Published: IEEE 2022-01-01
Series:IEEE Photonics Journal
Subjects:
Online Access:https://ieeexplore.ieee.org/document/9718139/
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author Yuan-Ting Shih
Kuo-Fang Chung
Ding-Wei Huang
author_facet Yuan-Ting Shih
Kuo-Fang Chung
Ding-Wei Huang
author_sort Yuan-Ting Shih
collection DOAJ
description Under the dimension of 6 µm overall length, a 220 nm partial parabolic taper fabricated on silicon-on-insulator (SOI) wafer with 2 µm buried oxide at 1.55 µm, to simply fabrication processes and reduce cost, we design a Partial parabolic single layer crossing, which modifies crossing curves around the crossing regions and input-output regions of crossing for fitting the initial input status of the fundamental mode. This single layer crossing for SOI photonic wires which are broadened using a 3 µm partial parabolic taper in each arm to get 97.8% high transmission (−0.097 dB) and −62 dB low crosstalk. It not only can simplify the fabrication processes, reduce cost, and shrink device size to produce more compact photonic circuits, but also keep high transmission over 96.8% even under ±10 nm fabrication dimension variation.
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spelling doaj.art-68184a22e8b74122a924209d6702f7472022-12-21T22:51:41ZengIEEEIEEE Photonics Journal1943-06552022-01-011421610.1109/JPHOT.2022.31529239718139Partial Parabolic Single Layer Crossing for Silicon-on-Insulator Nanophotonic WaveguidesYuan-Ting Shih0https://orcid.org/0000-0002-6580-3838Kuo-Fang Chung1Ding-Wei Huang2https://orcid.org/0000-0001-5992-2139Graduate Institute of Photonics and Optoelectronics, National Taiwan University, Taipei, TaiwanGraduate Institute of Photonics and Optoelectronics, National Taiwan University, Taipei, TaiwanDepartment of Electrical Engineering and the Graduate Institute of Photonics and Optoelectronics, National Taiwan University, Taipei, TaiwanUnder the dimension of 6 µm overall length, a 220 nm partial parabolic taper fabricated on silicon-on-insulator (SOI) wafer with 2 µm buried oxide at 1.55 µm, to simply fabrication processes and reduce cost, we design a Partial parabolic single layer crossing, which modifies crossing curves around the crossing regions and input-output regions of crossing for fitting the initial input status of the fundamental mode. This single layer crossing for SOI photonic wires which are broadened using a 3 µm partial parabolic taper in each arm to get 97.8% high transmission (−0.097 dB) and −62 dB low crosstalk. It not only can simplify the fabrication processes, reduce cost, and shrink device size to produce more compact photonic circuits, but also keep high transmission over 96.8% even under ±10 nm fabrication dimension variation.https://ieeexplore.ieee.org/document/9718139/Integrated nanophotonicwaveguide devices
spellingShingle Yuan-Ting Shih
Kuo-Fang Chung
Ding-Wei Huang
Partial Parabolic Single Layer Crossing for Silicon-on-Insulator Nanophotonic Waveguides
IEEE Photonics Journal
Integrated nanophotonic
waveguide devices
title Partial Parabolic Single Layer Crossing for Silicon-on-Insulator Nanophotonic Waveguides
title_full Partial Parabolic Single Layer Crossing for Silicon-on-Insulator Nanophotonic Waveguides
title_fullStr Partial Parabolic Single Layer Crossing for Silicon-on-Insulator Nanophotonic Waveguides
title_full_unstemmed Partial Parabolic Single Layer Crossing for Silicon-on-Insulator Nanophotonic Waveguides
title_short Partial Parabolic Single Layer Crossing for Silicon-on-Insulator Nanophotonic Waveguides
title_sort partial parabolic single layer crossing for silicon on insulator nanophotonic waveguides
topic Integrated nanophotonic
waveguide devices
url https://ieeexplore.ieee.org/document/9718139/
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AT kuofangchung partialparabolicsinglelayercrossingforsilicononinsulatornanophotonicwaveguides
AT dingweihuang partialparabolicsinglelayercrossingforsilicononinsulatornanophotonicwaveguides