Flexible reduced graphene oxide supercapacitors processed using atmospheric-pressure plasma jet under various temperatures adjusted by flow rate and jet-substrate distance
We vary the substrate temperature by adjusting the nitrogen flow rate and jet-substrate distance during nitrogen atmospheric-pressure plasma jet (APPJ) processing of screen-printed reduced graphene oxides (rGOs) on carbon cloth. The APPJ-processed rGOs on carbon cloth are then used as electrodes for...
| Main Authors: | , , , , , |
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| Format: | Article |
| Language: | English |
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IOP Publishing
2019-01-01
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| Series: | Materials Research Express |
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| Online Access: | https://doi.org/10.1088/2053-1591/ab59a2 |
| _version_ | 1827869641957965824 |
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| author | Ching-Feng Fan Yi-Chia Chien Cheng-Che Hsu I-Chun Cheng Li-Hsien Chien Jian-Zhang Chen |
| author_facet | Ching-Feng Fan Yi-Chia Chien Cheng-Che Hsu I-Chun Cheng Li-Hsien Chien Jian-Zhang Chen |
| author_sort | Ching-Feng Fan |
| collection | DOAJ |
| description | We vary the substrate temperature by adjusting the nitrogen flow rate and jet-substrate distance during nitrogen atmospheric-pressure plasma jet (APPJ) processing of screen-printed reduced graphene oxides (rGOs) on carbon cloth. The APPJ-processed rGOs on carbon cloth are then used as electrodes for supercapacitors. Increasing the nitrogen flow rate could reduce the gas temperature and enhance the reactivity of the reactive plasma species. Typically, lowering the temperature slows down the chemical reaction; however, increased reactivity of the reactive plasma species at the same jet-substrate distance could compensate the temperature effect. A nitrogen APPJ could improve the wettability of the screen-printed rGOs on carbon cloth. We found that 20-s APPJ treatment increases the areal capacitance from 6.2 mF cm ^−2 (without APPJ treatment) to 22.4 mF cm ^−2 (700 °C, 30 slm), as evaluated by galvanostatic charging/discharging (GCD) measurements under a constant current of 0.25 mA. Further, 20-s nitrogen APPJ processing at temperatures of ∼600 °C–700 °C could obtain the best areal capacitance value. The capacitance value of the fabricated flexible rGO supercapacitor remains at similar level after 1000-cycle mechanical bending test with a bending radius of 5 mm. |
| first_indexed | 2024-03-12T15:47:56Z |
| format | Article |
| id | doaj.art-6870a2db067e4441a323c61d24c58e6d |
| institution | Directory Open Access Journal |
| issn | 2053-1591 |
| language | English |
| last_indexed | 2024-03-12T15:47:56Z |
| publishDate | 2019-01-01 |
| publisher | IOP Publishing |
| record_format | Article |
| series | Materials Research Express |
| spelling | doaj.art-6870a2db067e4441a323c61d24c58e6d2023-08-09T15:21:23ZengIOP PublishingMaterials Research Express2053-15912019-01-017101560210.1088/2053-1591/ab59a2Flexible reduced graphene oxide supercapacitors processed using atmospheric-pressure plasma jet under various temperatures adjusted by flow rate and jet-substrate distanceChing-Feng Fan0Yi-Chia Chien1Cheng-Che Hsu2https://orcid.org/0000-0002-8366-3592I-Chun Cheng3Li-Hsien Chien4Jian-Zhang Chen5https://orcid.org/0000-0002-1071-2234Graduate Institute of Applied Mechanics, National Taiwan University , Taipei City 10617, Taiwan; Advanced Research Center for Green Materials Science and Technology, National Taiwan University , Taipei City 10617, TaiwanDepartment of Engineering Science and Ocean Engineering, Taipei City 10617, TaiwanDepartment of Chemical Engineering, National Taiwan University , Taipei City 10617, TaiwanGraduate Institute of Photonics and Optoelectronics, Department of Electrical Engineering, National Taiwan University , Taipei City 10617, TaiwanTaipei First Girls High School, Taipei City 10045, TaiwanGraduate Institute of Applied Mechanics, National Taiwan University , Taipei City 10617, Taiwan; Advanced Research Center for Green Materials Science and Technology, National Taiwan University , Taipei City 10617, TaiwanWe vary the substrate temperature by adjusting the nitrogen flow rate and jet-substrate distance during nitrogen atmospheric-pressure plasma jet (APPJ) processing of screen-printed reduced graphene oxides (rGOs) on carbon cloth. The APPJ-processed rGOs on carbon cloth are then used as electrodes for supercapacitors. Increasing the nitrogen flow rate could reduce the gas temperature and enhance the reactivity of the reactive plasma species. Typically, lowering the temperature slows down the chemical reaction; however, increased reactivity of the reactive plasma species at the same jet-substrate distance could compensate the temperature effect. A nitrogen APPJ could improve the wettability of the screen-printed rGOs on carbon cloth. We found that 20-s APPJ treatment increases the areal capacitance from 6.2 mF cm ^−2 (without APPJ treatment) to 22.4 mF cm ^−2 (700 °C, 30 slm), as evaluated by galvanostatic charging/discharging (GCD) measurements under a constant current of 0.25 mA. Further, 20-s nitrogen APPJ processing at temperatures of ∼600 °C–700 °C could obtain the best areal capacitance value. The capacitance value of the fabricated flexible rGO supercapacitor remains at similar level after 1000-cycle mechanical bending test with a bending radius of 5 mm.https://doi.org/10.1088/2053-1591/ab59a2atmospheric-pressure plasmareduced graphene oxideflow rategas temperaturesupercapacitor |
| spellingShingle | Ching-Feng Fan Yi-Chia Chien Cheng-Che Hsu I-Chun Cheng Li-Hsien Chien Jian-Zhang Chen Flexible reduced graphene oxide supercapacitors processed using atmospheric-pressure plasma jet under various temperatures adjusted by flow rate and jet-substrate distance Materials Research Express atmospheric-pressure plasma reduced graphene oxide flow rate gas temperature supercapacitor |
| title | Flexible reduced graphene oxide supercapacitors processed using atmospheric-pressure plasma jet under various temperatures adjusted by flow rate and jet-substrate distance |
| title_full | Flexible reduced graphene oxide supercapacitors processed using atmospheric-pressure plasma jet under various temperatures adjusted by flow rate and jet-substrate distance |
| title_fullStr | Flexible reduced graphene oxide supercapacitors processed using atmospheric-pressure plasma jet under various temperatures adjusted by flow rate and jet-substrate distance |
| title_full_unstemmed | Flexible reduced graphene oxide supercapacitors processed using atmospheric-pressure plasma jet under various temperatures adjusted by flow rate and jet-substrate distance |
| title_short | Flexible reduced graphene oxide supercapacitors processed using atmospheric-pressure plasma jet under various temperatures adjusted by flow rate and jet-substrate distance |
| title_sort | flexible reduced graphene oxide supercapacitors processed using atmospheric pressure plasma jet under various temperatures adjusted by flow rate and jet substrate distance |
| topic | atmospheric-pressure plasma reduced graphene oxide flow rate gas temperature supercapacitor |
| url | https://doi.org/10.1088/2053-1591/ab59a2 |
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