Flexible reduced graphene oxide supercapacitors processed using atmospheric-pressure plasma jet under various temperatures adjusted by flow rate and jet-substrate distance

Flexible reduced graphene oxide supercapacitors processed using atmospheric-pressure plasma jet under various temperatures adjusted by flow rate and jet-substrate distance

We vary the substrate temperature by adjusting the nitrogen flow rate and jet-substrate distance during nitrogen atmospheric-pressure plasma jet (APPJ) processing of screen-printed reduced graphene oxides (rGOs) on carbon cloth. The APPJ-processed rGOs on carbon cloth are then used as electrodes for...

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Bibliographic Details
Main Authors: Ching-Feng Fan, Yi-Chia Chien, Cheng-Che Hsu, I-Chun Cheng, Li-Hsien Chien, Jian-Zhang Chen
Format: Article
Language:English
Published: IOP Publishing 2019-01-01
Series:Materials Research Express
Subjects:
atmospheric-pressure plasma
reduced graphene oxide
flow rate
gas temperature
supercapacitor
Online Access:https://doi.org/10.1088/2053-1591/ab59a2

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