Flexible reduced graphene oxide supercapacitors processed using atmospheric-pressure plasma jet under various temperatures adjusted by flow rate and jet-substrate distance

Flexible reduced graphene oxide supercapacitors processed using atmospheric-pressure plasma jet under various temperatures adjusted by flow rate and jet-substrate distance

We vary the substrate temperature by adjusting the nitrogen flow rate and jet-substrate distance during nitrogen atmospheric-pressure plasma jet (APPJ) processing of screen-printed reduced graphene oxides (rGOs) on carbon cloth. The APPJ-processed rGOs on carbon cloth are then used as electrodes for...

Deskribapen osoa

Xehetasun bibliografikoak
Egile Nagusiak:	Ching-Feng Fan, Yi-Chia Chien, Cheng-Che Hsu, I-Chun Cheng, Li-Hsien Chien, Jian-Zhang Chen
Formatua:	Artikulua
Hizkuntza:	English
Argitaratua:	IOP Publishing 2019-01-01
Saila:	Materials Research Express
Gaiak:	atmospheric-pressure plasma reduced graphene oxide flow rate gas temperature supercapacitor
Sarrera elektronikoa:	https://doi.org/10.1088/2053-1591/ab59a2

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