Flexible reduced graphene oxide supercapacitors processed using atmospheric-pressure plasma jet under various temperatures adjusted by flow rate and jet-substrate distance

Flexible reduced graphene oxide supercapacitors processed using atmospheric-pressure plasma jet under various temperatures adjusted by flow rate and jet-substrate distance

We vary the substrate temperature by adjusting the nitrogen flow rate and jet-substrate distance during nitrogen atmospheric-pressure plasma jet (APPJ) processing of screen-printed reduced graphene oxides (rGOs) on carbon cloth. The APPJ-processed rGOs on carbon cloth are then used as electrodes for...

書目詳細資料
Main Authors:	Ching-Feng Fan, Yi-Chia Chien, Cheng-Che Hsu, I-Chun Cheng, Li-Hsien Chien, Jian-Zhang Chen
格式:	Article
語言:	English
出版:	IOP Publishing 2019-01-01
叢編:	Materials Research Express
主題:	atmospheric-pressure plasma reduced graphene oxide flow rate gas temperature supercapacitor
在線閱讀:	https://doi.org/10.1088/2053-1591/ab59a2

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