Ferroelectric vs. structural properties of large-distance sputtered epitaxial LSMO/PZT heterostructures

We report on large-distance rf-magnetron sputtering as a competitive alternative to pulsed laser deposition and off-axis sputtering for the growth of epitaxial PbZr0.52Ti0.48O3 (PZT) thin films. To determine the characteristics of the PZT films, the studies were focused on the interplay between micr...

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Main Authors: Philipp M. Leufke, Robert Kruk, Di Wang, Christian Kübel, Horst Hahn
Format: Article
Language:English
Published: AIP Publishing LLC 2012-09-01
Series:AIP Advances
Online Access:http://dx.doi.org/10.1063/1.4756997
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author Philipp M. Leufke
Robert Kruk
Di Wang
Christian Kübel
Horst Hahn
author_facet Philipp M. Leufke
Robert Kruk
Di Wang
Christian Kübel
Horst Hahn
author_sort Philipp M. Leufke
collection DOAJ
description We report on large-distance rf-magnetron sputtering as a competitive alternative to pulsed laser deposition and off-axis sputtering for the growth of epitaxial PbZr0.52Ti0.48O3 (PZT) thin films. To determine the characteristics of the PZT films, the studies were focused on the interplay between microstructural and ferroelectric properties. The films were deposited on insulating or conducting (Nb-doped) SrTiO3 and MgO substrates with La0.83Sr0.17MnO3 as bottom electrode. The uniformity and homogeneity of the samples was demonstrated by using large area (1.0 mm2) top electrodes. It is shown that epitaxial heterostructures of excellent crystalline and ferroelectric quality can be deposited from a stoichiometric PZT target without the need for excess PbO in the target or post-annealing of the samples.
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spelling doaj.art-69ff964dbbb44f7c811a7b97bddddd802022-12-21T18:54:11ZengAIP Publishing LLCAIP Advances2158-32262012-09-0123032184032184-1110.1063/1.4756997084203ADVFerroelectric vs. structural properties of large-distance sputtered epitaxial LSMO/PZT heterostructuresPhilipp M. Leufke0Robert Kruk1Di Wang2Christian Kübel3Horst Hahn4Institute of Nanotechnology (INT), Karlsruhe Institute of Technology (KIT), Karlsruhe, GermanyInstitute of Nanotechnology (INT), Karlsruhe Institute of Technology (KIT), Karlsruhe, GermanyInstitute of Nanotechnology (INT), Karlsruhe Institute of Technology (KIT), Karlsruhe, GermanyInstitute of Nanotechnology (INT), Karlsruhe Institute of Technology (KIT), Karlsruhe, GermanyInstitute of Nanotechnology (INT), Karlsruhe Institute of Technology (KIT), Karlsruhe, GermanyWe report on large-distance rf-magnetron sputtering as a competitive alternative to pulsed laser deposition and off-axis sputtering for the growth of epitaxial PbZr0.52Ti0.48O3 (PZT) thin films. To determine the characteristics of the PZT films, the studies were focused on the interplay between microstructural and ferroelectric properties. The films were deposited on insulating or conducting (Nb-doped) SrTiO3 and MgO substrates with La0.83Sr0.17MnO3 as bottom electrode. The uniformity and homogeneity of the samples was demonstrated by using large area (1.0 mm2) top electrodes. It is shown that epitaxial heterostructures of excellent crystalline and ferroelectric quality can be deposited from a stoichiometric PZT target without the need for excess PbO in the target or post-annealing of the samples.http://dx.doi.org/10.1063/1.4756997
spellingShingle Philipp M. Leufke
Robert Kruk
Di Wang
Christian Kübel
Horst Hahn
Ferroelectric vs. structural properties of large-distance sputtered epitaxial LSMO/PZT heterostructures
AIP Advances
title Ferroelectric vs. structural properties of large-distance sputtered epitaxial LSMO/PZT heterostructures
title_full Ferroelectric vs. structural properties of large-distance sputtered epitaxial LSMO/PZT heterostructures
title_fullStr Ferroelectric vs. structural properties of large-distance sputtered epitaxial LSMO/PZT heterostructures
title_full_unstemmed Ferroelectric vs. structural properties of large-distance sputtered epitaxial LSMO/PZT heterostructures
title_short Ferroelectric vs. structural properties of large-distance sputtered epitaxial LSMO/PZT heterostructures
title_sort ferroelectric vs structural properties of large distance sputtered epitaxial lsmo pzt heterostructures
url http://dx.doi.org/10.1063/1.4756997
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