Effects of hot isostatic pressure on titanium nitride films deposited by physical vapor deposition

Effects of hot isostatic pressure on titanium nitride films deposited by physical vapor deposition

Films of titanium nitride deposited by physical vapor deposition on 304 L stainless steel substrates were hot isostatic pressed (HIP) under 150 MPa at 550 °C. To study the effects of this treatment on the microstructure of those films, X-ray diffraction analyses, Rutherford Backscattering spectrosco...

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Bibliographic Details
Main Authors: M.J. Carbonari, J.R. Martinelli
Format: Article
Language:English
Published: Associação Brasileira de Metalurgia e Materiais (ABM); Associação Brasileira de Cerâmica (ABC); Associação Brasileira de Polímeros (ABPol) 2001-07-01
Series:Materials Research
Subjects:
Titanium nitride
PVD
HIP
Online Access:http://www.scielo.br/scielo.php?script=sci_arttext&pid=S1516-14392001000300004

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