Investigation of anomalous diffusion of aluminum into silicon
The process of Al diffusion into silicon substrate of an integrated circuit is studied experimentally and theoretically in details in order to analyze the invariance of the diffusion mechanism according to the Arrhenius law. During the process of practical investigation of the aluminum admixture wit...
Main Authors: | Alexey V. Bespalov, Mikhail S. Afanasyev, Olga L. Golikova, Igor A. Kharitonov, Alexandra A. Muravyeva |
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Format: | Article |
Language: | English |
Published: |
Joint Stock Company "Experimental Scientific and Production Association SPELS
2023-05-01
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Series: | Безопасность информационных технологий |
Subjects: | |
Online Access: | https://bit.spels.ru/index.php/bit/article/view/1510 |
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