High L21-atomic ordering and spin-polarization in Co2MnZ (Z = Ge, Sn) Heusler thin films with low-temperature annealing process

Although an enhanced magnetoresistance (MR) has been observed in many Co2-based Heusler alloys by promoting their structural ordering from B2 to L21 by post-annealing at higher temperatures (Tann > 500 °C), it is desirable to search for other Heusler alloys that crystallize in L21-order below 300...

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Main Authors: Varun Kumar Kushwaha, Yuya Sakuraba, Tomoya Nakatani, Taisuke Sasaki, Ivan Kurniawan, Yoshio Miura, Hiroo Tajiri, Kazuhiro Hono
Format: Article
Language:English
Published: AIP Publishing LLC 2022-09-01
Series:APL Materials
Online Access:http://dx.doi.org/10.1063/5.0117593
_version_ 1797984958166335488
author Varun Kumar Kushwaha
Yuya Sakuraba
Tomoya Nakatani
Taisuke Sasaki
Ivan Kurniawan
Yoshio Miura
Hiroo Tajiri
Kazuhiro Hono
author_facet Varun Kumar Kushwaha
Yuya Sakuraba
Tomoya Nakatani
Taisuke Sasaki
Ivan Kurniawan
Yoshio Miura
Hiroo Tajiri
Kazuhiro Hono
author_sort Varun Kumar Kushwaha
collection DOAJ
description Although an enhanced magnetoresistance (MR) has been observed in many Co2-based Heusler alloys by promoting their structural ordering from B2 to L21 by post-annealing at higher temperatures (Tann > 500 °C), it is desirable to search for other Heusler alloys that crystallize in L21-order below 300 °C, as the maximum Tann is restricted for processing devices. For Co2MnZ (Z = Ge, Sn) Heusler alloys, an L21-order is expected to appear even in the as-deposited state or by a low-temperature annealing process due to their very high L21 to B2-order transition temperature (>1500 K). Here, epitaxial Co2MnZ films were grown on MgO (001) substrate at room temperature (RT) and post-annealed at Tann = 200–500 °C. Interestingly, as-sputtered films exhibit L21-ordering, which improves systematically upon increasing Tann. The spin-polarization of electric current (β) was estimated at RT using nonlocal spin-valve (NLSV) devices by measuring the spin-accumulation signal in a copper (Cu) channel. It was found that at Tann = 300 °C, the β value of Co2MnGe films is higher (∼0.65) than that of Co2FeGe0.5Ga0.5 films due to a higher degree of L21-order, which makes the Co2MnGe alloy a promising ferromagnetic electrode for spintronic device applications.
first_indexed 2024-04-11T07:11:17Z
format Article
id doaj.art-6c1de6b0cfe94cb9ad99a9b6f1c79a44
institution Directory Open Access Journal
issn 2166-532X
language English
last_indexed 2024-04-11T07:11:17Z
publishDate 2022-09-01
publisher AIP Publishing LLC
record_format Article
series APL Materials
spelling doaj.art-6c1de6b0cfe94cb9ad99a9b6f1c79a442022-12-22T04:38:12ZengAIP Publishing LLCAPL Materials2166-532X2022-09-01109091119091119-710.1063/5.0117593High L21-atomic ordering and spin-polarization in Co2MnZ (Z = Ge, Sn) Heusler thin films with low-temperature annealing processVarun Kumar Kushwaha0Yuya Sakuraba1Tomoya Nakatani2Taisuke Sasaki3Ivan Kurniawan4Yoshio Miura5Hiroo Tajiri6Kazuhiro Hono7National Institute for Materials Science, 1-2-1 Sengen, Tsukuba 305-0047, JapanNational Institute for Materials Science, 1-2-1 Sengen, Tsukuba 305-0047, JapanNational Institute for Materials Science, 1-2-1 Sengen, Tsukuba 305-0047, JapanNational Institute for Materials Science, 1-2-1 Sengen, Tsukuba 305-0047, JapanNational Institute for Materials Science, 1-2-1 Sengen, Tsukuba 305-0047, JapanNational Institute for Materials Science, 1-2-1 Sengen, Tsukuba 305-0047, JapanJapan Synchrotron Radiation Research Institute, Sayo, Hyogo 679-5198, JapanNational Institute for Materials Science, 1-2-1 Sengen, Tsukuba 305-0047, JapanAlthough an enhanced magnetoresistance (MR) has been observed in many Co2-based Heusler alloys by promoting their structural ordering from B2 to L21 by post-annealing at higher temperatures (Tann > 500 °C), it is desirable to search for other Heusler alloys that crystallize in L21-order below 300 °C, as the maximum Tann is restricted for processing devices. For Co2MnZ (Z = Ge, Sn) Heusler alloys, an L21-order is expected to appear even in the as-deposited state or by a low-temperature annealing process due to their very high L21 to B2-order transition temperature (>1500 K). Here, epitaxial Co2MnZ films were grown on MgO (001) substrate at room temperature (RT) and post-annealed at Tann = 200–500 °C. Interestingly, as-sputtered films exhibit L21-ordering, which improves systematically upon increasing Tann. The spin-polarization of electric current (β) was estimated at RT using nonlocal spin-valve (NLSV) devices by measuring the spin-accumulation signal in a copper (Cu) channel. It was found that at Tann = 300 °C, the β value of Co2MnGe films is higher (∼0.65) than that of Co2FeGe0.5Ga0.5 films due to a higher degree of L21-order, which makes the Co2MnGe alloy a promising ferromagnetic electrode for spintronic device applications.http://dx.doi.org/10.1063/5.0117593
spellingShingle Varun Kumar Kushwaha
Yuya Sakuraba
Tomoya Nakatani
Taisuke Sasaki
Ivan Kurniawan
Yoshio Miura
Hiroo Tajiri
Kazuhiro Hono
High L21-atomic ordering and spin-polarization in Co2MnZ (Z = Ge, Sn) Heusler thin films with low-temperature annealing process
APL Materials
title High L21-atomic ordering and spin-polarization in Co2MnZ (Z = Ge, Sn) Heusler thin films with low-temperature annealing process
title_full High L21-atomic ordering and spin-polarization in Co2MnZ (Z = Ge, Sn) Heusler thin films with low-temperature annealing process
title_fullStr High L21-atomic ordering and spin-polarization in Co2MnZ (Z = Ge, Sn) Heusler thin films with low-temperature annealing process
title_full_unstemmed High L21-atomic ordering and spin-polarization in Co2MnZ (Z = Ge, Sn) Heusler thin films with low-temperature annealing process
title_short High L21-atomic ordering and spin-polarization in Co2MnZ (Z = Ge, Sn) Heusler thin films with low-temperature annealing process
title_sort high l21 atomic ordering and spin polarization in co2mnz z ge sn heusler thin films with low temperature annealing process
url http://dx.doi.org/10.1063/5.0117593
work_keys_str_mv AT varunkumarkushwaha highl21atomicorderingandspinpolarizationinco2mnzzgesnheuslerthinfilmswithlowtemperatureannealingprocess
AT yuyasakuraba highl21atomicorderingandspinpolarizationinco2mnzzgesnheuslerthinfilmswithlowtemperatureannealingprocess
AT tomoyanakatani highl21atomicorderingandspinpolarizationinco2mnzzgesnheuslerthinfilmswithlowtemperatureannealingprocess
AT taisukesasaki highl21atomicorderingandspinpolarizationinco2mnzzgesnheuslerthinfilmswithlowtemperatureannealingprocess
AT ivankurniawan highl21atomicorderingandspinpolarizationinco2mnzzgesnheuslerthinfilmswithlowtemperatureannealingprocess
AT yoshiomiura highl21atomicorderingandspinpolarizationinco2mnzzgesnheuslerthinfilmswithlowtemperatureannealingprocess
AT hirootajiri highl21atomicorderingandspinpolarizationinco2mnzzgesnheuslerthinfilmswithlowtemperatureannealingprocess
AT kazuhirohono highl21atomicorderingandspinpolarizationinco2mnzzgesnheuslerthinfilmswithlowtemperatureannealingprocess