Investigation on tailoring physical properties of Nickel Oxide thin films grown by dc magnetron sputtering

Investigation on tailoring physical properties of Nickel Oxide thin films grown by dc magnetron sputtering

We report a comprehensive study on influence of oxygen partial pressure on NiO thin films grown on glass substrates in a combined argon and oxygen ambience by reactive dc magnetron sputtering. In this present article, we have discussed the dependence of oxygen pressure on structural, chemical, morph...

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Bibliographic Details
Main Authors:	Parashurama Salunkhe, Muhammed Ali A V, Dhananjaya Kekuda
Format:	Article
Language:	English
Published:	IOP Publishing 2020-01-01
Series:	Materials Research Express
Subjects:	electrical conductivity oxygen flow rate NiO thin films X-ray photoelectron spectroscopy chemical state quantification
Online Access:	https://doi.org/10.1088/2053-1591/ab69c5

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