Influence of different pretreatments on the adhesion of nanodiamond composite films on Ti substrates via coaxial arc plasma deposition
In this study, we report on the novel growth of nanodiamond composite (NDC) films on titanium (Ti) substrates using the coaxial arc plasma deposition (CAPD) at room temperature, which offers several advantages over conventional growth techniques. CAPD employs a unique coaxial arc plasma gun structur...
| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
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IOP Publishing
2023-01-01
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| Series: | Materials Research Express |
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| Online Access: | https://doi.org/10.1088/2053-1591/acd992 |
| _version_ | 1797746474893705216 |
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| author | Lama Osman Ali M Ali Abdelrahman Zkria Hiroshi Naragino Tsuyoshi Yoshitake |
| author_facet | Lama Osman Ali M Ali Abdelrahman Zkria Hiroshi Naragino Tsuyoshi Yoshitake |
| author_sort | Lama Osman |
| collection | DOAJ |
| description | In this study, we report on the novel growth of nanodiamond composite (NDC) films on titanium (Ti) substrates using the coaxial arc plasma deposition (CAPD) at room temperature, which offers several advantages over conventional growth techniques. CAPD employs a unique coaxial arc plasma gun structure that provides a supersaturated condition of highly energetic carbon ions (C ^+ ) for ultrafast quenching on the substrate, promoting the growth of nanodiamond grains. This allows for NDC films’ growth on diverse substrates without the need for initial seeding or substrate heating. However, the growth of NDC films on Ti substrates at room temperature is challenging due to the native oxide layer (TiO _2 ). Here, we grew NDC films on Ti substrates using three different pretreatments: (i) hydrofluoric acid (HF) etching, (ii) insertion of a titanium carbide (TiC) intermediate layer, and (iii) in situ Ar ^+ plasma etching. The morphology and structure of the grown NDC films were examined by 3D laser, high-resolution scanning electron microscopies (HR-SEM), Raman, and x-ray photoelectron (XPS) spectroscopies. Our results demonstrate that in situ Ar ^+ plasma etching is the most effective pretreatment method for completely removing the native TiO _2 layer compared to the other two ex situ pretreatments, in which re-oxidation is more likely to occur after these pretreatments. Furthermore, NDC films grown using the hybrid Ar ^+ ion etching gun (IG) and CAPD exhibit the highest sp ^3 content (63%) and adhesion strength (16 N). |
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| institution | Directory Open Access Journal |
| issn | 2053-1591 |
| language | English |
| last_indexed | 2024-03-12T15:38:15Z |
| publishDate | 2023-01-01 |
| publisher | IOP Publishing |
| record_format | Article |
| series | Materials Research Express |
| spelling | doaj.art-6d9bb182a4344d7593309627a72050862023-08-09T16:07:47ZengIOP PublishingMaterials Research Express2053-15912023-01-0110606640110.1088/2053-1591/acd992Influence of different pretreatments on the adhesion of nanodiamond composite films on Ti substrates via coaxial arc plasma depositionLama Osman0https://orcid.org/0000-0001-5675-482XAli M Ali1https://orcid.org/0000-0002-2925-8641Abdelrahman Zkria2https://orcid.org/0000-0003-0928-8752Hiroshi Naragino3https://orcid.org/0000-0002-3012-6603Tsuyoshi Yoshitake4https://orcid.org/0000-0002-5780-5585Department of Applied Science for Electronics and Materials, Kyushu University , Fukuoka 816-8580, Japan; Department of Physics, Faculty of Science, Aswan University , Aswan 81528, EgyptDepartment of Applied Science for Electronics and Materials, Kyushu University , Fukuoka 816-8580, Japan; Department of Physics, Faculty of Science, Al-Azhar University , Cairo 11884, EgyptDepartment of Applied Science for Electronics and Materials, Kyushu University , Fukuoka 816-8580, Japan; Department of Physics, Faculty of Science, Aswan University , Aswan 81528, EgyptDepartment of Applied Science for Electronics and Materials, Kyushu University , Fukuoka 816-8580, JapanDepartment of Applied Science for Electronics and Materials, Kyushu University , Fukuoka 816-8580, JapanIn this study, we report on the novel growth of nanodiamond composite (NDC) films on titanium (Ti) substrates using the coaxial arc plasma deposition (CAPD) at room temperature, which offers several advantages over conventional growth techniques. CAPD employs a unique coaxial arc plasma gun structure that provides a supersaturated condition of highly energetic carbon ions (C ^+ ) for ultrafast quenching on the substrate, promoting the growth of nanodiamond grains. This allows for NDC films’ growth on diverse substrates without the need for initial seeding or substrate heating. However, the growth of NDC films on Ti substrates at room temperature is challenging due to the native oxide layer (TiO _2 ). Here, we grew NDC films on Ti substrates using three different pretreatments: (i) hydrofluoric acid (HF) etching, (ii) insertion of a titanium carbide (TiC) intermediate layer, and (iii) in situ Ar ^+ plasma etching. The morphology and structure of the grown NDC films were examined by 3D laser, high-resolution scanning electron microscopies (HR-SEM), Raman, and x-ray photoelectron (XPS) spectroscopies. Our results demonstrate that in situ Ar ^+ plasma etching is the most effective pretreatment method for completely removing the native TiO _2 layer compared to the other two ex situ pretreatments, in which re-oxidation is more likely to occur after these pretreatments. Furthermore, NDC films grown using the hybrid Ar ^+ ion etching gun (IG) and CAPD exhibit the highest sp ^3 content (63%) and adhesion strength (16 N).https://doi.org/10.1088/2053-1591/acd992nanodiamond composite filmstitaniumsurface pretreatmentsroom temperature growthcoaxial arc plasma deposition |
| spellingShingle | Lama Osman Ali M Ali Abdelrahman Zkria Hiroshi Naragino Tsuyoshi Yoshitake Influence of different pretreatments on the adhesion of nanodiamond composite films on Ti substrates via coaxial arc plasma deposition Materials Research Express nanodiamond composite films titanium surface pretreatments room temperature growth coaxial arc plasma deposition |
| title | Influence of different pretreatments on the adhesion of nanodiamond composite films on Ti substrates via coaxial arc plasma deposition |
| title_full | Influence of different pretreatments on the adhesion of nanodiamond composite films on Ti substrates via coaxial arc plasma deposition |
| title_fullStr | Influence of different pretreatments on the adhesion of nanodiamond composite films on Ti substrates via coaxial arc plasma deposition |
| title_full_unstemmed | Influence of different pretreatments on the adhesion of nanodiamond composite films on Ti substrates via coaxial arc plasma deposition |
| title_short | Influence of different pretreatments on the adhesion of nanodiamond composite films on Ti substrates via coaxial arc plasma deposition |
| title_sort | influence of different pretreatments on the adhesion of nanodiamond composite films on ti substrates via coaxial arc plasma deposition |
| topic | nanodiamond composite films titanium surface pretreatments room temperature growth coaxial arc plasma deposition |
| url | https://doi.org/10.1088/2053-1591/acd992 |
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