Effect of Process Parameters on Mode Conversion in Submicron Tapered Silicon Ridge Waveguides

The modal property and light propagation in tapered silicon ridge waveguides with different ridge heights are investigated for a silicon on insulator (SOI) platform with a 500 nm silicon (Si) thickness. Mode conversion between the transverse magnetic (TM) fundamental and higher-order transverse elec...

Ausführliche Beschreibung

Bibliographische Detailangaben
Hauptverfasser: Zakriya Mohammed, Bruna Paredes, Mahmoud Rasras
Format: Artikel
Sprache:English
Veröffentlicht: MDPI AG 2021-03-01
Schriftenreihe:Applied Sciences
Schlagworte:
Online Zugang:https://www.mdpi.com/2076-3417/11/5/2366

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