Photochemical Micro-/Nano-Swelling of Silicone Rubber Induced by Long Pulse-Repetition Interval of an ArF Excimer Laser

Photochemical Micro-/Nano-Swelling of Silicone Rubber Induced by Long Pulse-Repetition Interval of an ArF Excimer Laser

Long pulse-repetition intervals of 100 to 500 ms of a 193 nm ArF excimer laser successfully increased the height of the photochemical micro-/nano-swelling of silicone rubber, observed with a scanning electron microscope. The effect of the interval was seen despite the heating of the silicone rubber...

Deskribapen osoa

Xehetasun bibliografikoak
Egile nagusia:	Masayuki Okoshi
Formatua:	Artikulua
Hizkuntza:	English
Argitaratua:	MDPI AG 2021-05-01
Saila:	Electronic Materials
Gaiak:	micro-/nano-swelling silicone rubber ArF excimer laser pulse-repetition interval photodissociation
Sarrera elektronikoa:	https://www.mdpi.com/2673-3978/2/2/10

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