Plasma Power Effect on the Surfaces of a Quartz Crystal During Etching using Tetrafluoroethane Gas

Plasma Power Effect on the Surfaces of a Quartz Crystal During Etching using Tetrafluoroethane Gas

The performance of a quartz crystal microbalance (QCM) biosensor can be enhanced by patterning the surface of the SiO2 substrate. In this study, the patterning was realized by a plasma etching process. The etching of the SiO2 was carried out using a tetrafluoroethane (CH2FCF3) plasma. The plasma was...

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Bibliographic Details
Main Authors: Masruroh Masruroh, Mahardika Auditia Hanif, Setyawan P. Sakti, D.J. Djoko H. Santjojo
Format: Article
Language:English
Published: Universitas Indonesia 2017-12-01
Series:International Journal of Technology
Subjects:
Anisotropic coefficient
Etching rate
Low-frequency generator
Tetrafluoroethane gas
Online Access:http://ijtech.eng.ui.ac.id/article/view/721

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